2005
DOI: 10.1088/0957-0233/16/6/001
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Accurate and traceable calibration of one-dimensional gratings

Abstract: Accurate and traceable calibration of lateral standards (1D and 2D gratings) is a basic metrological task for nano- and microtechnology. Both the mean pitch and the uniformity of the gratings should be measured quantitatively. Although optical diffractometers are effective for measuring the mean pitch, they are not able to measure the uniformity of gratings. In this study, the calibration of gratings is performed using a metrological large range scanning probe microscope with optimized measurement strategies. … Show more

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Cited by 110 publications
(104 citation statements)
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“…First, a threshold line is set to divide the nano-grating profiles into two parts. For the GC method [1], [11]- [13], the geometrical center above the threshold line is treated as the gravity center; the distance of two neighboring gravity centers is defined as the pitch. For the ZCP method [11], [12], zero cross points are the intersection points between the threshold line and profile curves of the nano-grating pattern.…”
Section: A Pitch Evaluation Methods With Lermentioning
confidence: 99%
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“…First, a threshold line is set to divide the nano-grating profiles into two parts. For the GC method [1], [11]- [13], the geometrical center above the threshold line is treated as the gravity center; the distance of two neighboring gravity centers is defined as the pitch. For the ZCP method [11], [12], zero cross points are the intersection points between the threshold line and profile curves of the nano-grating pattern.…”
Section: A Pitch Evaluation Methods With Lermentioning
confidence: 99%
“…The selected PTVH is around 50 nm with very smooth and uniform parallel lines in Fig.3.a) and Fig.3.b). The original pixel size of the image is 488×450, we did the data interpolation and low pass filter to eliminate the imaging noise [1]. As mentioned before, the LER is calculated over left and right edges of a length L which is divided into 20 spacings apart (Fig.3.a)).…”
Section: B Cr Atom Lithography Nano-gratingsmentioning
confidence: 99%
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“…The structure period was processed using the Fourier transform method. 17,19 The mean structure periods obtained over all the measurements are presented in Table 2 for the two modes of operation (CM and IM). A better statistical result can be achieved for scans of very long lines.…”
Section: Application For Long-range Measurementsmentioning
confidence: 99%