2021
DOI: 10.1088/2631-7990/abff6a
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Achieving a sub-10 nm nanopore array in silicon by metal-assisted chemical etching and machine learning

Abstract: Solid-state nanopores with controllable pore size and morphology have huge application potential. However, it has been very challenging to process sub-10 nm silicon nanopore arrays with high efficiency and high quality at low cost. In this study, a method combining metal-assisted chemical etching and machine learning is proposed to fabricate sub-10 nm nanopore arrays on silicon wafers with various dopant types and concentrations. Through a SVM algorithm, the relationship between the nanopore structures and the… Show more

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Cited by 30 publications
(13 citation statements)
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“…The pattern of nano-hole array was prepared by the nanosphere lithography method, which had been reported in the previous publications. [44][45][46][47] Subsequently, a Au or Pt flim was coated on the patterned SiC sample. Then the residual photoresist or nanosphere was removed by acetone coupled with ultrasonic vibration.…”
Section: Methodsmentioning
confidence: 99%
“…The pattern of nano-hole array was prepared by the nanosphere lithography method, which had been reported in the previous publications. [44][45][46][47] Subsequently, a Au or Pt flim was coated on the patterned SiC sample. Then the residual photoresist or nanosphere was removed by acetone coupled with ultrasonic vibration.…”
Section: Methodsmentioning
confidence: 99%
“…The correlation between the internet search index and patient arrivals was verified by Pearson correlation coefficient, Johansen cointegration, and Granger causality analysis. We then applied 8 forecasting models to predict ED patient arrivals, including ELM, generalized linear model (GLM), autoregressive integrated moving average model (ARIMA), ARIMA with explanatory variables (ARIMAX), support vector machine (SVM), artificial neural network (ANN), random forest (RF), and long short-term memory (LSTM) [24][25][26][27][28][29][30][31][32][33]. After that, their performances were evaluated in terms of accuracy and robustness analysis.…”
Section: Overviewmentioning
confidence: 99%
“…With the continuous progress of the process in recent years, especially the achievements in the nanometer order of magnitude, the maturity and stability of etching have been improved [ 24 , 25 , 26 ]. This brings great convenience to the production of traditional 3D electrode detectors.…”
Section: Introductionmentioning
confidence: 99%