Advanced Bilayer Resist Process With Optimized PMGT Formulation

Brunsvold, William R.; Lyons, Christopher F.; Conley, Willard E.; Crockatt, Dale M.; Skinner, Michael L.; Uptmor, Ann

doi:10.1117/12.953041

Cited by 3 publications

(3 citation statements)

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“…Poly͑dimethylglutarimide͒ ͑PMGI͒ is a resist that is commonly used in bilayer [1][2][3][4][5][6][7][8][9][10][11] and trilayer [12][13][14] imaging applications. For example, PMGI can be used to create lift-off profiles with thicknesses greater than 10 m. 8 In addition to being used as a resist, PMGI has also been used as an optical material in microfabricated optical devices [15][16][17] and as both a structural layer and a sacrificial layer in surface micromachining.…”

Section: Introductionmentioning

confidence: 99%

Isopropanol/water as a developer for poly(dimethylglutarimide)

Johnstone

Foulds

Pallapa

et al. 2008

J. Micro/Nanolith. MEMS MOEMS

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Poly͑dimethylglutarimide͒ ͑PMGI͒ is a resist that is commonly used in bilayer and trilayer imaging applications. PMGI can be exposed using various radiation sources including deep UV. Currently, there are only two developers for PMGI reported in the literature: tetramethylammonium hydroxide and tetraethylammonium hydroxide. We introduce a new developer for PMGI, a mixture of isopropanol ͑IPA͒ and water. Samples were irradiated with deep UV at 254 nm. The IPA/water developer exhibits rapid dissolution of exposed PMGI, of many microns per minute. However, PMGI exhibits high absorption at 254 nm, so the development depth is limited. The depth limit, after a critical dose, increases linearly with the exposure dose. © 2008 Society of Photo-Optical Instrumentation Engineers.

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Section: Introductionmentioning

confidence: 99%

Isopropanol/water as a developer for poly(dimethylglutarimide)

Johnstone

Foulds

Pallapa

et al. 2008

J. Micro/Nanolith. MEMS MOEMS

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“…PMGI is widely used as an underlayer for a bilayer liftoff process. The chemical structures for two of the main polymer repeat units are shown in Figure . As can be seen, PMGI has multiple ligand sites on the polymer chain.…”

mentioning

confidence: 99%

“…Since PMGI is not miscible with photoresist, it is widely used for liftoff processes . Because of this immiscibility, photoresists can be directly coated and patterned on top of a PMGI layer.…”

mentioning

confidence: 99%

Iron Nanoparticles Derived from Iron-Complexed Polymethylglutarimide To Produce High-Quality Lithographically Defined Single-Walled Carbon Nanotubes

Moll

et al. 2005

Chem. Mater.

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Synthesis ofN‐Substituted Maleimides and Poly(styrene‐co‐N‐maleimide) Copolymers and Their Potential Application as Photoresists

Eken

Käfer

Yuan

et al. 2022

Macro Chemistry & Physics

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Poly(styrene-co-N-maleimide) copolymers bearing tert-butoxycarbonyl (t-BOC)-protected amine groups attached to side chains of varying lengths are synthesized via activators regenerated by electron transfer atom transfer radical polymerization (ARGET-ATRP) and investigated from the perspective of photoresist applications. The length of the alkyl substituents enables control of thermal properties as well as hydrophobicity, which are critically important for resist processing. Removal of the acid labile t-BOC group during deep-UV (DUV)exposure shifts solubility in the exposed areas and well-defined line space patterns of 1 μm are obtained for the selected copolymers. The correlation between glass transition temperature (T g ) and solubility contrast determines the lithographic performance where the copolymers with shorter alkyl chains exhibit promising results.

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Advanced Bilayer Resist Process With Optimized PMGT Formulation

Cited by 3 publications

References 0 publications

Isopropanol/water as a developer for poly(dimethylglutarimide)

Isopropanol/water as a developer for poly(dimethylglutarimide)

Iron Nanoparticles Derived from Iron-Complexed Polymethylglutarimide To Produce High-Quality Lithographically Defined Single-Walled Carbon Nanotubes

Synthesis ofN‐Substituted Maleimides and Poly(styrene‐co‐N‐maleimide) Copolymers and Their Potential Application as Photoresists

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