Advanced in-situ particle monitor for Applied Materials implanter applications

Abstract

In-situ particle monitors offer significant benefits in cost of ownership for ion implant applications. Particle excursions and out-of-control conditions are detected and alarmed as they occur, minimizing the potential for scrapping future product runs. Applied Materials are now qualifying an advanced technology in-situ particle sensor for the xR80 series and W O O S (9500 series) implanters. Utilizing Particle Measuring Systems, Inc. technology, this system directly addresses the historical limitations with in-situ particle monitors. Electronic and thermally sensitive components are kept out of the processor chamber. Very high optical power is generated in the sensor, detecting particles as small as 0.08 pm at velocities up to10 d s . Testing to date indicates this sensor offers excellent performance in monitoring particle excursions and a good correlation to small particles counted on wafers.