Successful integration of in-situ particle monitoring into a volume 300mm high current implant manufacturing system

Simmons, J.G.; Scottney-Castle, M.; Maskiell, C.; Lumpkin, J.

doi:10.1109/iit.2002.1258004

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Successful integration of in-situ particle monitoring into a volume 300mm high current implant manufacturing system

Cited by 3 publications

References 1 publication

In-situ particle monitor using virtual metrology system for measuring particle contamination during plasma etching process

In-situ particle monitor using virtual metrology system for measuring particle contamination during plasma etching process

Particles contaminations detection during plasma etching process by using k-nearest neighbors and Fuzzy k-nearest neighbors

A Novel Method for Deposit Accumulation Assessment in Dry Etching Chamber

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