2008
DOI: 10.1016/j.jenvman.2007.01.016
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Advanced oxidation treatment of pulp mill effluent for TOC and toxicity removals

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Cited by 72 publications
(49 citation statements)
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“…A rapid decrease of toxicity has also been reported for several effluents from the pulp and paper industry (Catalkaya and Kargi 2008;Chang et al 2004;Pérez et al 2001;Reyes et al 1998;Yeber et al 2000). Furthermore, COD was particularly reported to be very efficiently removed (≈ 90%) from a bleaching effluent of a nonrecovered paper mill by TiO 2 photocatalysis (Toor et al 2007), and from an agroresidue-based soda bleaching effluent by both TiO 2 (COD removal ≈ 90%) and ZnO (COD removal ≈ 95%) photocatalytic treatments (Kansal et al 2008) (Table 4).…”
Section: Semi-conductor Photocatalytic Processesmentioning
confidence: 75%
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“…A rapid decrease of toxicity has also been reported for several effluents from the pulp and paper industry (Catalkaya and Kargi 2008;Chang et al 2004;Pérez et al 2001;Reyes et al 1998;Yeber et al 2000). Furthermore, COD was particularly reported to be very efficiently removed (≈ 90%) from a bleaching effluent of a nonrecovered paper mill by TiO 2 photocatalysis (Toor et al 2007), and from an agroresidue-based soda bleaching effluent by both TiO 2 (COD removal ≈ 90%) and ZnO (COD removal ≈ 95%) photocatalytic treatments (Kansal et al 2008) (Table 4).…”
Section: Semi-conductor Photocatalytic Processesmentioning
confidence: 75%
“…Additionally, Catalkaya and Kargi (2008) achieved an 84% TOC removal applying this treatment to pre-biologically treated effluents from the pulp and paper industry (Table 4); and Mounteer et al (2007) further reported the increase of organic matter content in the treated effluent after performing this type of treatment, which might have been caused by colloidal matter solubilization during the oxidative process. In short, about an average 10% COD removal enhancement could be expected when the photocatalytic treatment of pulp and paper mill effluents is assisted by the addition of H 2 O 2 (Figure 2).…”
Section: Uv/tio 2 /H 2 Omentioning
confidence: 82%
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