Advanced SIMS quantification in the first few nm of B, P and As ultrashallow implants

Merkulov, A.; Peres, P.; Choi, S.; Desse, F.; Schuhmacher, M.

doi:10.1002/sia.3459

Cited by 4 publications

(2 citation statements)

References 7 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Included in this number is a paper by Merkulov and co-workers, who compared the use of both primary ion types during the depth-profile analysis of As, B and P in ultra-shallow implants. 318 The ablation rate achievable was 1 and 2 nm min À1 for Cs + and O 2…”

Section: Sims and Tof-sims Applicationsmentioning

confidence: 96%

See 1 more Smart Citation

Atomic spectrometry update. Industrial analysis: metals, chemicals and advanced materials

Carter

Fisher

Goodall

et al. 2011

J. Anal. At. Spectrom.

View full text Add to dashboard Cite

Metals 1.1 Ferrous metals and alloys 1.2 Non-ferrous metals and alloys 2 Chemicals 2.1 Petroleum and petroleum products 2.1.1 Petroleum products -gasoline, diesels, gasohol, exhaust particulates 2.1.2 Fuel -coal, fly ash, particulates/emissions 2.1.3 Oils -crude oil, lubricants 2.1.4 Alternative fuels 2.2 Organic chemicals and solvents 2.2.1 The analysis of archaeological and art objects 2.2.2 LIBS and other laser techniques 2.2.3 Mass spectrometric techniques 2.2.4 Ion beam techniques 2.2.5 Speciation 2.2.6 Extraction, preconcentration and sample introduction 2.3 Inorganic chemicals and acids 2.3.1 Reviews, overviews and CRMs 2.3.2 Cements, concretes and plasters 2.3.3 Matrix modifiers 2.3.4 Forensic applications 2.3.5 Other applications 2.3.6 The analysis of nano-structures 2.3.6.1 Reviews and CRMs 2.3.6.2 Methods of analysis 2.4 Nuclear materials 2.4.1 Reviews and overviews 2.4.2 Nuclear forensic and safeguards applications 2.4.3 Other nuclear applications 3 Advanced materials 3.1 Polymeric materials and composites

show abstract

Section: Sims and Tof-sims Applicationsmentioning

confidence: 96%

“…318 The ablation rate achievable was 1 and 2 nm min À1 for Cs + and O 2 + respectively when a primary ion beam with an energy of 150 eV was used. Several authors have used low energy O 2 + or Cs + ion beams.…”

Section: X-ray Based Techniquesmentioning

confidence: 98%

Atomic spectrometry update. Industrial analysis: metals, chemicals and advanced materials

Carter

Fisher

Goodall

et al. 2011

J. Anal. At. Spectrom.

View full text Add to dashboard Cite

show abstract

Secondary ion mass spectrometry quantification of boron distribution in an array of silicon nanowires

et al. 2023

View full text Add to dashboard Cite

Improvement of extra low impact energy SIMS data reduction algorithm for process control

Merkulov

Peres

Soulard

et al. 2020

Journal of Vacuum Science &Amp; Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phen

View full text Add to dashboard Cite

This work explores quantitative boron depth profiling in the top first nanometer using dynamic secondary ion mass spectrometry (SIMS). Dynamic SIMS measurements were performed with a magnetic sector CAMECA IMS Wf/SC Ultra, using extremely low impact energy O2+ (below 250 eV) sputtering. It was concluded that the modification of quantification protocol by the creation of a surface transient curve can provide a tool for the accurate characterization of low energy implantation wafers, including boron, under extremely low energy sputtering conditions with an oxygen beam.

show abstract

Advanced SIMS quantification in the first few nm of B, P and As ultrashallow implants

Cited by 4 publications

References 7 publications

Atomic spectrometry update. Industrial analysis: metals, chemicals and advanced materials

Atomic spectrometry update. Industrial analysis: metals, chemicals and advanced materials

Secondary ion mass spectrometry quantification of boron distribution in an array of silicon nanowires

Improvement of extra low impact energy SIMS data reduction algorithm for process control

Contact Info

Product

Resources

About