2005
DOI: 10.1117/12.599715
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Advances in hardware, software, and automation for 193nm aerial image measurement systems

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Cited by 3 publications
(1 citation statement)
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“…An increased system stability, new beam homogenisation and energy monitoring provide new performance parameters such as long-term illumination stability with drifts less than 2.5%/h and CD repeatability in the 1nm range at the wafer level. 6,7,8 Table 1 shows measurement results on a binary test mask with static line width/CD repeatability (10 times repeated) based on isolated and dense lines of 100nm and 80nm at wafer level (sample 1) and results on a MoSi test mask for 100nm at wafer level (sample 2). Profile plots have been extracted for the center line of a line and space test pattern and line width was determined using the threshold model.…”
Section: Introductionmentioning
confidence: 99%
“…An increased system stability, new beam homogenisation and energy monitoring provide new performance parameters such as long-term illumination stability with drifts less than 2.5%/h and CD repeatability in the 1nm range at the wafer level. 6,7,8 Table 1 shows measurement results on a binary test mask with static line width/CD repeatability (10 times repeated) based on isolated and dense lines of 100nm and 80nm at wafer level (sample 1) and results on a MoSi test mask for 100nm at wafer level (sample 2). Profile plots have been extracted for the center line of a line and space test pattern and line width was determined using the threshold model.…”
Section: Introductionmentioning
confidence: 99%