Aerosol assisted chemical vapour deposition of germanium thin films using organogermanium carboxylates as precursors and formation of germania films

Abstract

Diethyl germanium bis-picolinate, [Et 2 Ge(O 2 CC 5 H 4 N) 2 ], and trimethyl germanium quinaldate, [Me 3 Ge(O 2 CC 9 H 6 N)], have been used as precursors for deposition of thin films of germanium by aerosol assisted chemical vapour deposition (AACVD). The thermogravimetric analysis revealed complete volatilization of complexes under nitrogen atmosphere. Germanium thin films were deposited on silicon wafers at 700 • C employing AACVD method. These films on oxidation under an oxygen atmosphere at 600 • C yield GeO 2. Both Ge and GeO 2 films were characterized by XRD, SEM and EDS measurements. Their electrical properties were assessed by current-voltage (I-V) characterization.

Structural differences in the luminescence properties of lanthanide doped orthorhombic and monoclinic phases of Y2GeO5

“…All emission measurements were carried out with a resolution of 5 nm. Synthesis Y 2 GeO 5 samples were prepared by a different method from an earlier report, 5 as the reported method yields a product contaminated by $200 ppm of K + ions. In a typical experiment, Y 2 (CO 3 ) 3 $3H 2 O (545 mg, 1.32 mmol) was dissolved in HCl (1.5 ml, 11.5 N) and excess acid was evaporated by the repeated addition of 3 ml aliquots of distilled water.…”

“…4 Germanium based materials have potential applications in microelectronic devices (the band gaps of Ge, GeO 2 and Y 2 GeO 5 are 0.67, 6.1 and 4.1 eV, respectively). [4][5][6] Since the difference between the electronegativity of germanium and oxygen (1.43) is lower than that between Si and O (1.54) or Al and O (1.83), the ternary oxides based on germanium and yttrium can have lower band gaps, higher conductivities, and hence are expected to show better luminescence efficiencies under eld emission conditions. 7 In the Y-Ge system, the compounds Y 2 GeO 5 , Y 4 GeO 8 and Y 2 Ge 2 O 7 have been reported.…”

GeO2 Thin Film Deposition on Graphene Oxide by the Hydrogen Peroxide Route: Evaluation for Lithium-Ion Battery Anode

“…Coating of particulates is perhaps the most challenging form of film deposition, since polycondensation acceleration cannot be performed by simple solvent evaporation and concentration increase as in spin-, dip-, spray-, and spread-coating processes, though aerosol-assisted chemical vapor deposition is an interesting recent alternative . The Pechini method for film formation is widely used for the coating of tin moieties, − and it allows thickness control under acidic conditions.…”

Metal Chalcogenide Nanocrystalline Solid Thin Films

“…Shah et al 58 prepared GeO 2 thin films by aerosolassisted CVD (AA-CVD). An organogermanium carboxylate was dissolved in dry benzene in a twonecked RB flask, which was connected to a quartz tube placed in a horizontal tube furnace.…”