In order to improve the stability, sensitivity or efficiency of AlGaN/GaN based sensors employing high electron mobility transistors (HEMTs), Schottky diodes and/or resistors they should be integrated into micro-electro-mechanical-systems (MEMS). The creation of appropriate diaphragms and/or cantilevers is necessary for the verification of sensing properties of such MEMS sensors. In this paper, we present possible approaches to improve the fabrication of micromechanic structures in bulk SiC substrates with epitaxial AlGaN/GaN heterostructures using femtosecond laser ablation to fabricate SiC diaphragms. The objective of this work is also to point at the backside damaging effects and to find an optimal method for its elimination or suppression.
IntroductionAlGaN/GaN based high electron mobility transistors (HEMTs), Schottky diodes and/or resistors have been effectively presented as sensing devices for mechanical or chemical sensors operating at extreme conditions. However, much of them were fabricated on bulk substrate materials [1], [2]. In order to improve their stability, sensitivity or efficiency, they should be integrated into micro-electro-mechanical-systems (MEMS). Therefore, the creation of appropriate diaphragms and/or cantilevers is necessary for the verification of sensing properties of such MEMS sensors. Laser ablation can fabricate SiC diaphragms much faster than electrochemical, photochemical, or reactive ion etching (RIE). Recently, we presented the possibilities to combine laser ablation technique with RIE for bulk micromachining of SiC [3]. We demonstrated the feasibility to fabricate micromechanic structures in bulk SiC substrates with epitaxial AlGaN/GaN heterostructures (Fig. 1) by femtosecond laser ablation at 520nm wavelength for pressure sensor applications [4]. Using a 300μ 4H-SiC substrate we produced an array of 250μ deep and 500μ diameter blind holes without damaging of the AlGaN/GaN heterostructures (Fig. 2). Our laser system delivered 100kHz of 350fs pulses with an average power of 950mW in the fundamental (1040nm) and 350-380mW in the second harmonic (520nm) wavelength. The 350mW output power in the SH was already the minimum power required to drill the holes down to a depth of 250μ -300μ. Therefore we made tests also with the higher laser power output at 1040nm but this led to severe damage at the backside of the substrate (Fig. 3). Consequently, we investigated "two colour laser ablation" [5] to enhance the yield and improve the machining results. An effective back side damage reduction was obtained with respect to the results when only 1040nm were used. But still the surface quality at the back side did not reach the same level as we had for ablation using only 350mW at