An all-silicon, single-mode Bragg cladding rib waveguide

Teo, Ee Jin; Bettiol, Andrew A.; Xiong, B. Q.; Breese, M.B.H.; Shuvan, Prashant T.

doi:10.1364/oe.18.008816

Cited by 4 publications

(3 citation statements)

References 25 publications

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“…A single-mode Bragg cladding rib waveguide is also demonstrated in 0.02 W cm silicon [61], which consists of PSi layers with a low refractive index core that is bounded by DBRs comprising eight bilayers of alternating high and low refractive index. Irradiation acts to reduce the thickness of PSi formed, as described in section 3, creating an optical barrier needed for lateral confinement.…”

Section: Waveguides For Silicon Photonicsmentioning

confidence: 99%

Three-dimensional silicon micromachining

Azimi

Song

Dang

et al. 2012

J. Micromech. Microeng.

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A process for fabricating arbitrary-shaped, two-and three-dimensional silicon and porous silicon components has been developed, based on high-energy ion irradiation, such as 250 keV to 1 MeV protons and helium. Irradiation alters the hole current flow during subsequent electrochemical anodization, allowing the anodization rate to be slowed or stopped for low/high fluences. For moderate fluences the anodization rate is selectively stopped only at depths corresponding to the high defect density at the end of ion range, allowing true three-dimensional silicon machining. The use of this process in fields including optics, photonics, holography and nanoscale depth machining is reviewed.

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Section: Waveguides For Silicon Photonicsmentioning

confidence: 99%

Three-dimensional silicon micromachining

Azimi

Song

Dang

et al. 2012

J. Micromech. Microeng.

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“…17 In nanotechnology, ferromagnetic nanostructures can be incorporated in porous silicon channels, 18 patterned porous silicon substrates are used to generate interconnected networks of niobium nanowires, 19 and thin films of nanostructured porous silicon can be filled by capillary forces. 20 In photonics, 21 porous silicon waveguides have been fabricated for infrared wavelengths, 14,22 and hollow waveguides in Ta 2 O 5 and SiO 2 films are described in ref. 22.…”

Section: Introductionmentioning

confidence: 99%

“…20 In photonics, 21 porous silicon waveguides have been fabricated for infrared wavelengths, 14,22 and hollow waveguides in Ta 2 O 5 and SiO 2 films are described in ref. 22. The DIPS process (direct imprinting of porous substrates) uses porous silicon as an imprintable material for use in plasmonics, holography, and sensing.…”

Section: Introductionmentioning

confidence: 99%

Buried centimeter-long micro- and nanochannel arrays in porous silicon and glass

et al. 2014

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We developed a simple process to fabricate deeply buried micro- and nanoscale channels in glass and porous silicon from bulk silicon using a combination of ion beam irradiation, electrochemical anodization and high temperature oxidation. The depth, width and length of these structures can be controllably varied and we successfully fabricated an array of centimeter-long buried micro- and nanochannels. This process allows densely packed, arbitrary-shaped channel geometries with micro- to nanoscale dimensions to be produced in a three-dimensional multilevel architecture, providing a route to fabricate complex devices for use in nanofluidics and lab-on-a-chip systems. We demonstrate the integration of these channels with large reservoirs for DNA linearization in high aspect ratio nanochannels.

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