“…3 with the Hall carrier density measured in [6] on diodes implanted with similar N Al values and annealed at the same temperature of 2223K /5mi n. Moreover, to best simulate the experimental curves in Fig. 2, in addition to the previous V Al expression, the apparent bandgap narrowing, V G , in the heavily doped regions has been modeled as in [10], the carrier mobility as in [11], and, finally, the electron and hole lifetimes have been assumed, for simplicity, wherever coincident and temperature-doping dependent as in [11], τ = τ 0 (T /300) α 1 + N A(D) /5 × 10 16 −1 , with α and τ 0 taken as fitting parameters. Operating in this way, best fit gave α = 2.15 and τ 0 equal to 10ns and 1ns for n−type and p−type regions, respectively, whereas, to describe the lower voltage portion of the J D -V D curves in Fig.…”