An Approach to Lithographically Defined Self‐Assembled Nanoparticle Films

Abstract

Lithographically defined nanoparticle films with high quality and excellent uniformity have been fabricated using a combination of bottom‐up self‐assembly and top‐down interferometic lithography. Using this simple, fast, and versatile approach, various 1D and 2D mesoscopic patterns of silica nanoparticle films are easily fabricated over a large area with nanometer‐scale periodicity (see figure).

Random sequential adsorption on imprecise lattice

“…The second condition is 2 ℓ 2 , which is the reverse of the condition, encountered earlier, that yielded the left-hand side of the inequality in Eq. (9). It ensures that an arriving object that has space to deposit, has a finite (noninfinitesimal) "wiggle space" between its two earlier-deposited neighbors.…”

Self‐Assembling Nanoparticles at Surfaces and Interfaces

“…Additionally, desired properties and structural effects in the assembled materials can be accomplished using suitable templates. Self-assembly is achievable using simple methods such as evaporation-based assembly producing spontaneously ordered multi-dimensional structures, [23] or by more advanced methods of patterned self-assembly using lithography [24] and microcontact printing, [25] where only the patterned areas with suitable chemical functionalities create organized nanoparticle networks on substrates. In recent years, using bottom-up approaches of self-organization, a variety of organized nanostructures have been created.…”

Fabrication and characterization of long range surface plasmon devices based on metallic subwavelength gratings

“…Interferometric lithography (IL) is a preferred technique for fabricating large-area one-dimensional (1-D), twodimensional (2-D), and three-dimensional (3-D) periodic structures for various applications [23][24][25][26][27][28][29][30]. The periodic structure forms through the interference of multiple coherent laser beams, or multiple exposures [31].…”