2015
DOI: 10.1063/1.4931569
|View full text |Cite
|
Sign up to set email alerts
|

An atomistic vision of the Mass Action Law: Prediction of carbon/oxygen defects in silicon

Abstract: International audienceWe introduce an atomistic description of the kinetic Mass Action Law to predict concentrations of defects and complexes. We demonstrate in this paper that this approach accurately predicts carbon/oxygen related defect concentrations in silicon upon annealing. The model requires binding and migration energies of the impurities and complexes, here obtained from density functional theory (DFT) calculations. Vacancy-oxygen complex kinetics are studied as a model system during both isochronal … Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1
1

Citation Types

0
4
0

Year Published

2016
2016
2018
2018

Publication Types

Select...
5

Relationship

1
4

Authors

Journals

citations
Cited by 5 publications
(4 citation statements)
references
References 24 publications
0
4
0
Order By: Relevance
“…To reproduce the sample preparation process, we simulated the experimental sample preparation, tracking concentrations of various compound point defects in silicon exposed to electron irradiation. The concentrations of defects were extracted from Kinetic Mass Action Law (KMAL) simulations 31 . KMAL is a theoretical model based on a rate theory, which we use to reproduce temperature-driven diffusion-limited reactions.…”
Section: Resultsmentioning
confidence: 99%
“…To reproduce the sample preparation process, we simulated the experimental sample preparation, tracking concentrations of various compound point defects in silicon exposed to electron irradiation. The concentrations of defects were extracted from Kinetic Mass Action Law (KMAL) simulations 31 . KMAL is a theoretical model based on a rate theory, which we use to reproduce temperature-driven diffusion-limited reactions.…”
Section: Resultsmentioning
confidence: 99%
“…Although, mass action models have been used to other semiconducting materials such as Ge and Si 1-x Ge x it becomes increasingly difficult to model ternary materials [47][48][49] Considering the kinetics of the processes the picture becomes even more complicated in ternary semiconductors but forms a fruitful field for further experimental and theoretical investigations [50][51][52][53].…”
Section: Other Considerationsmentioning
confidence: 99%
“…This can happen through the formation of interstitial carbon (C i ) which is highly mobile even at room temperature (RT) and becomes trapped by intrinsic point defects or impurities to form complex, more stable point defects, which may be electrically active (14,15). These defect pairs can act as nuclei for further carbon clustering by trapping more C atoms, according to the reaction schemes proposed in the literature (16)(17)(18)(19). In this paper, a Deep-Level Transient Spectroscopy (DLTS) analysis is performed to address this issue, since some of the Crelated defects correspond with levels in the bandgap of silicon.…”
Section: Introductionmentioning
confidence: 99%