An insight into the structure–property relationships of PECVD SiCxNy(O):H materials

Coustel, Romain; Haacké, M.; Rouessac, V.; Durand, J.; Drobek, Martin; Julbe, A.

doi:10.1016/j.micromeso.2014.02.043

Cited by 12 publications

(11 citation statements)

References 42 publications

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“…Amorphous hydrogenated silicon carbonitride films have been subject of significant research effort over the past decade . Indeed, SiC x N y :H appears as a promising candidate for a wide range of applications including mechanical layer [6,8,10,20,21,23,24], optical layer [1,3,6,9,[18][19][20][21][22]25], low-k dielectric layer [4,5], protective layer [17,20], surface passivation layer for silicon solar cells [2,7,25] and gas separation membranes [13,[26][27][28].…”

Section: Introductionmentioning

confidence: 99%

“…Amorphous silicon carbonitride films have been obtained through various deposition techniques including both physical vapor deposition (PVD) and chemical vapor deposition (CVD). In particular, different magnetron PVD technologies (DC [17,24] RF [17,18] or high power pulse magnetron sputtering [17]), as well as vapor transport-CVD [16] or different plasma enhanced CVD (PECVD) technologies (low frequency [13,23,[25][26][27], radio frequency [2,[4][5][6][7][8][9]12,14,15], microwave, [1,19,22,28] remote PECVD [3,10,11] or atmospheric pressure PECVD [20,21]), were carefully examined in the literature. Adjusting the deposition conditions (type and concentration of precursor, additional reactants, substrate temperature, type of carrier gas…) allows tuning both the composition and the bonding configuration that greatly affect material properties (electronic properties [22], gas transport [26], …).…”

Section: Introductionmentioning

confidence: 99%

See 1 more Smart Citation

Vibrational frequencies of hydrogenated silicon carbonitride: A DFT study

Coustel

Haacké

Rouessac

et al. 2017

Surface and Coatings Technology

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Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Vibrational frequencies of hydrogenated silicon carbonitride: A DFT study

Coustel

Haacké

Rouessac

et al. 2017

Surface and Coatings Technology

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“…However, the microstructure of these membranes was not fully stable upon aging in air. In order to prepare more stable membrane materials, another low frequency experimental setup has been built to deposit these PECVD a‐SiC x N y :H films at higher temperatures up to 573 K . When considering the scale‐up to industry of such lab‐scale deposition process, a microwaves (MW) plasma discharge generated by electron cyclotron resonance (ECR) sources is usually preferred to low frequency one .…”

Section: Introductionmentioning

confidence: 99%

Microwave PECVD Silicon Carbonitride Thin Films: A FTIR and Ellipsoporosimetry Study

Haacké

Coustel

Rouessac

et al. 2015

Plasma Process. Polym.

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Amorphous non-oxide a-SiC x N y :H thin films have been synthesized at 300 or 500 K from an Ar/HMDSN/NH 3 gas mixture in a lab-scale microwaves PECVD reactor. These thin films have been characterized by FTIR spectroscopy and spectroscopic ellipsometry coupled with gas adsorption, in order to evidence the influence of PECVD synthesis conditions on the materials composition and microstructure. Deposition at high temperature (500 K) was found to yield more inorganic and more compact films in comparison with those obtained at room temperature. In addition, when considering long term aging at room temperature for more than 1 month, the films synthesized at high temperature were found to be more stable toward oxidation in (humid) air.

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“…It allows the fabrication of tailored coatings with regard to mechanical and chemical properties and, at the same time, enables low coating thicknesses in the nanometer range. The formation of organosilica layers by PECVD utilizing hexamethyldisiloxane (HMDSO) as a precursor results in membranes with gas separation characteristics [ 15 , 16 , 17 , 18 , 19 , 20 , 21 , 22 , 23 ]. Inorganic [ 24 , 25 , 26 , 27 ] or organic substrate membranes [ 15 , 21 , 22 , 23 , 28 , 29 , 30 , 31 , 32 , 33 ] function as support for the thin organosilica layer.…”

Section: Introductionmentioning

confidence: 99%

On the Mixed Gas Behavior of Organosilica Membranes Fabricated by Plasma-Enhanced Chemical Vapor Deposition (PECVD)

et al. 2022

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Selective, nanometer-thin organosilica layers created by plasma-enhanced chemical vapor deposition (PECVD) exhibit selective gas permeation behavior. Despite their promising pure gas performance, published data with regard to mixed gas behavior are still severely lacking. This study endeavors to close this gap by investigating the pure and mixed gas behavior depending on temperatures from 0 °C to 60 °C for four gases (helium, methane, carbon dioxide, and nitrogen) and water vapor. For the two permanent gases, helium and methane, the studied organosilica membrane shows a substantial increase in selectivity from αHe/CH4 = 9 at 0 °C to αHe/CH4 = 40 at 60 °C for pure as well as mixed gases with helium permeance of up to 300 GPU. In contrast, a condensable gas such as CO2 leads to a decrease in selectivity and an increase in permeance compared to its pure gas performance. When water vapor is present in the feed gas, the organosilica membrane shows even stronger deviations from pure gas behavior with a permeance loss of about 60 % accompanied by an increase in ideal selectivity αHe/CO2 from 8 to 13. All in all, the studied organosilica membrane shows very promising results for mixed gases. Especially for elevated temperatures, there is a high potential for separation by size exclusion.

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An insight into the structure–property relationships of PECVD SiCxNy(O):H materials

Cited by 12 publications

References 42 publications

Vibrational frequencies of hydrogenated silicon carbonitride: A DFT study

Vibrational frequencies of hydrogenated silicon carbonitride: A DFT study

Microwave PECVD Silicon Carbonitride Thin Films: A FTIR and Ellipsoporosimetry Study

On the Mixed Gas Behavior of Organosilica Membranes Fabricated by Plasma-Enhanced Chemical Vapor Deposition (PECVD)

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