InGaAs quantum wells embedded in GaAs nanowires can serve
as compact
near-infrared emitters for direct integration onto Si complementary
metal oxide semiconductor technology. While the core–shell
geometry in principle allows for a greater tuning of composition and
emission, especially farther into the infrared, the practical limits
of elastic strain accommodation in quantum wells on multifaceted nanowires
have not been established. One barrier to progress is the difficulty
of directly comparing the emission characteristics and the precise
microstructure of a single nanowire. Here we report an approach to
correlating quantum well morphology, strain, defects, and emission
to understand the limits of elastic strain accommodation in nanowire
quantum wells specific to their geometry. We realize full 3D Bragg
coherent diffraction imaging (BCDI) of intact quantum wells on vertically
oriented epitaxial nanowires, which enables direct correlation with
single-nanowire photoluminescence. By growing In0.2Ga0.8As quantum wells of distinct thicknesses on different facets
of the same nanowire, we identified the critical thickness at which
defects are nucleated. A correlation with a traditional transmission
electron microscopy analysis confirms that BCDI can image the extended
structure of defects. Finite element simulations of electron and hole
states explain the emission characteristics arising from strained
and partially relaxed regions. This approach, imaging the 3D strain
and microstructure of intact nanowire core–shell structures
with application-relevant dimensions, can aid the development of predictive
models that enable the design of new compact infrared emitters.