1999
DOI: 10.1063/1.369381
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Analysis of memory retention characteristics of ferroelectric field effect transistors using a simple metal–ferroelectric–metal–insulator–semiconductor structure

Abstract: Memory retention characteristics of metal–ferroelectric–metal–insulator–semiconductor (MFMIS) field effect transistors (FETs) were investigated in detail using a simple structure, referred to as quasi-MFMIS, in which one electrode of the metal–ferroelectric–metal (MFM) capacitor is connected to a gate electrode of a conventional metal–oxide–semiconductors (MOS) FET using an external interconnection cable. It was found that the memory window of the MFMIS FET was quickly lost (after about 1000 s) and from a comp… Show more

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Cited by 21 publications
(6 citation statements)
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“…This phenomenon might have originated from the polarization relaxation of the ferroelectric domain (37)(38). The polarization loss can be accelerated by polarization shielding effects of injected and trapped mobile charges and by the depolarization field inevitably remaining in the ferroelectric film during retention interval (39)(40). However, we should note that the I PSC relaxation could substantially affect the learning accuracy if enough time has passed, which is one of the challenges of the ferroelectric-based synapse (fig.…”
Section: Synaptic Characteristics and Switching Mechanismmentioning
confidence: 99%
“…This phenomenon might have originated from the polarization relaxation of the ferroelectric domain (37)(38). The polarization loss can be accelerated by polarization shielding effects of injected and trapped mobile charges and by the depolarization field inevitably remaining in the ferroelectric film during retention interval (39)(40). However, we should note that the I PSC relaxation could substantially affect the learning accuracy if enough time has passed, which is one of the challenges of the ferroelectric-based synapse (fig.…”
Section: Synaptic Characteristics and Switching Mechanismmentioning
confidence: 99%
“…18 However, their retention properties, which are closely related to the performance of memory devices, have been studied less. [19][20][21][22][23][24] In this article, we focus on investigation of polarization decay dynamics by means of SFM and on the effect of the switching pulse parameters, switching prehistory, and domain polarity on polarization retention. It will be shown how a particular bottom electrode material affects film retentivity.…”
Section: Introductionmentioning
confidence: 99%
“…Among several polytypes, 4H-SiC is considered as the most attractive one because of its wider bandgap (E g ∼ = 3.2 eV) as well as higher and more isotropic bulk mobility than other polytypes. However, up to now the electrical properties and the defect charges in SiC MF(I)S have not been studied in detail [9,10] and the studies on MFMIS have only been on Si. In this work, we report on the electrical characteristics and the properties of MFMIS and MF(I)S structures on 4H-SiC as well as process integration for FETs using these structures.…”
Section: Introductionmentioning
confidence: 98%