2021
DOI: 10.1039/d1nr02773e
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Analysis of the electron emission characteristics and working mechanism of a planar bottom gate vacuum field emission triode with a nanoscale channel

Abstract: A planar lateral Vacuum Field Emission Triode (VFET) with nanoscale channel of 80∼90 nm was fabricated on silicon wafer. The nanoscale channel of this vacuum triode was generated by using...

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Cited by 16 publications
(8 citation statements)
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“…In general, Fowler–Nordheim (FN) tunneling and Schottky emission are the two primary mechanisms of the electron emission performances of NACDs. [ 5a,12a,21 ] The simplified linear FN equation explaining the relationship between the field emission current and anode voltage is given by Equation () [ 22 ] ln()I/V2badbreak=lnAgoodbreak−B/V$$\begin{equation} \ln \left( {I/{V}^2} \right) = \ln A - B/V \end{equation}$$where A and B are the linear and exponential factors of the field emission current with values of A = 1.54×10 −6 β 2 φ −1 d −2 α and B = 6.83×10 9 dφ 3/2 β −1 . Here α is the effective field emission area, β is the field enhancement factor, φ is the work function of the cathode ( φ Au = 5.1 eV, φ GaN = 4.0 eV), and d is the length of the air channel.…”
Section: Resultsmentioning
confidence: 99%
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“…In general, Fowler–Nordheim (FN) tunneling and Schottky emission are the two primary mechanisms of the electron emission performances of NACDs. [ 5a,12a,21 ] The simplified linear FN equation explaining the relationship between the field emission current and anode voltage is given by Equation () [ 22 ] ln()I/V2badbreak=lnAgoodbreak−B/V$$\begin{equation} \ln \left( {I/{V}^2} \right) = \ln A - B/V \end{equation}$$where A and B are the linear and exponential factors of the field emission current with values of A = 1.54×10 −6 β 2 φ −1 d −2 α and B = 6.83×10 9 dφ 3/2 β −1 . Here α is the effective field emission area, β is the field enhancement factor, φ is the work function of the cathode ( φ Au = 5.1 eV, φ GaN = 4.0 eV), and d is the length of the air channel.…”
Section: Resultsmentioning
confidence: 99%
“…Planar diode [26] Metal Nanosphere lithography 6.88 0.7 -Planar diode [27] Ta EBL 24 0.5 -Planar triode [21] PdO Electro-forming process 80-90 5 -…”
Section: Electrical Performance and Operating Mechanisms Of The Gan Nacdmentioning
confidence: 99%
“…On the other hand, planar-type NVCTs with a typical back-gate structure are generally isolated by a dielectric layer from the gate and the nanoscale vacuum channel, which can greatly suppress the gate leakage current [ 12 , 13 , 14 , 15 , 16 ]. Moreover, the planar structure means that the emitter and the collector of the device are in the same plane, in which a sub-100 nm vacuum gap is created between them by high-precision processing [ 17 ].…”
Section: Introductionmentioning
confidence: 99%
“…Recently, many studies on vacuum electronic devices were conducted, involving vacuum diodes and triodes [20][21][22], where the vacuum channel length was designed at the nanometer scale. Thus, these devices can operate in air without performance degradation.…”
Section: Introductionmentioning
confidence: 99%
“…As is known to all, a vacuum is the superior media for carrier transportation, as opposed to semiconductor materials, where electrons travel ballistically without being scattered by a lattice or captured by defects. Vacuum electronics are generally considered to be more suitable for harsh environments [20][21][22] or faster detecting [23] than solid-state electronics. The existing vacuum devices are used for photon detection [23] or signal modulation [24,25].…”
Section: Introductionmentioning
confidence: 99%