Infrared Technology and Applications XLV 2019
DOI: 10.1117/12.2521173
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Antimonite-based gap-engineered type-II superlattice materials grown by MBE and MOCVD for the third generation of infrared imagers

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Cited by 25 publications
(17 citation statements)
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“…Collected data of dark current density versus cut‐off wavelength in the MWIR regime at two different temperature ranges a) from 70 to 99 K and b) from 150 to 170 K for barrier Ga‐free, [ 22,57,82,83,129,144–148,160–163,166,192,223,224 ] nonbarrier Ga‐free, [ 118,130,167,220–222,225 ] barrier Ga‐based, [ 87,149,168,170,172,174–176,183,193,219,226–228 ] and nonbarrier Ga‐based [ 68,101,108,111,173,177–179,181,189,215–218,229–237 ] T2SL PDs in comparison with “Rule 07.”…”
Section: Optical and Electrical Performance Of Pdsmentioning
confidence: 99%
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“…Collected data of dark current density versus cut‐off wavelength in the MWIR regime at two different temperature ranges a) from 70 to 99 K and b) from 150 to 170 K for barrier Ga‐free, [ 22,57,82,83,129,144–148,160–163,166,192,223,224 ] nonbarrier Ga‐free, [ 118,130,167,220–222,225 ] barrier Ga‐based, [ 87,149,168,170,172,174–176,183,193,219,226–228 ] and nonbarrier Ga‐based [ 68,101,108,111,173,177–179,181,189,215–218,229–237 ] T2SL PDs in comparison with “Rule 07.”…”
Section: Optical and Electrical Performance Of Pdsmentioning
confidence: 99%
“…As a result, a low V/III flux ratio and high trimethylantimony (TMSb)/(TMSb+AsH 3 ) mole fraction is necessary to achieve high Sb composition during InAsSb layer growth. [ 117 ] Razeghi et al [ 118 ] used diluted AsH 3 for the MOCVD growth of the InAsSb layer and pure AsH 3 for the InAs layer at a low V/III ratio to enhance Sb incorporation. Although significant work and progress have been made in the growth of InAs/GaSb and InAs/InAsSb T2SL materials and devices by MBE [ 102,116,119–123 ] and MOCVD, [ 107,124–130 ] growth of barrier structures is generally challenging because barrier structures usually contain Al‐material such as AlSb, AlAs, or AlAsSb, and Al‐containing materials are challenging to grow and susceptible to oxidation during both growth and processing stages.…”
Section: Fundamental Materials Properties Of the Type‐ii Superlatticementioning
confidence: 99%
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“…As one of the effective methods, the empirical tight-binding method (ETBM) was implemented to calculate the band structure and cut-off wavelength of the superlattice structure [14]. The type II staggered gap band alignment of the superlattice structure was able to deliver excellent infrared detection with its flexible band structure engineering capabilities using different combinations and compositions of Antimony-based structures such as InAs/GaSb/AlSb or InAs/InAsSb [15][16][17][18][19]. So far, several designs based on superlattice structure were implemented for different types of high gain devices [20][21][22][23].…”
Section: Introductionmentioning
confidence: 99%
“…Mid-wavelength infrared (MWIR) photodetectors which can operate under the low flux conditions are of great interest for long-range military and astronomical applications. [1,2] In most of these applications there is a need to increase the capability of the system to detect light in a low photon flux situation. Therefore, gain-based devices such as heterojunction phototransistors (HPTs) and avalanche photodiodes (APDs) are used to achieve the necessary photoresponse when the incoming photon flux is low.…”
mentioning
confidence: 99%