Application of magnetic neutral loop discharge plasma to SiO2 etching process

Stochastic electron energy gain in inductively coupled magnetized plasmas accompanying electron reflection at chamber wall

“…6,30) Plasma control via magnetic fields, e.g., for modulation utilizing the magnetic shutter effect for low-damage material processing and promotion of volume reactions for negative ion etchant production, is expected as a potential application of X-point plasmas. 6) On the other hand, the NLD plasmas, [1][2][3][31][32][33] which are used for etching, are driven under a quadrupole magnetic field induced by three coaxial coils. The NLD plasma has a magnetically neutral loop, and the plasma becomes ring-shaped along the neutral loop.…”

“…19) Here, the variables with primes represent quantities before reflection. The distribution of the reflection angle ¼ arctan½ðv 2 y þ v 2 z Þ 1=2 =v x was assumed to be of specular or diffuse reflection. Basically, specular reflection (v x ¼ Àv 0…”

“…Low-pressure inductively coupled magnetized plasmas are utilized for material processing. [1][2][3] Among various interactions of electrons in these plasmas, deposition of electric power to electrons [4][5][6] is one of the most fundamental processes for plasma sustainment. A macroscopic approach to plasma power deposition was to estimate the effective power using an equivalent circuit based on a transformer model.…”

Analysis of electron heating due to partial resonance in an inductively coupled plasma under confronting divergent magnetic fields

“…Application of magnetic fields to plasmas is an effective way to keep the plasma density high even at low pressures. For example, the magnetic neutral loop discharge (NLD) plasma [1][2][3][4][5][6][7][8] for etching are high-density inductively coupled plasma (ICP) generated under a quadrupole magnetic field (QMF). As well, the X-point plasma, 9,10) which is an ICP proposed originally as a negative ion source, is driven under confronting divergent magnetic fields (CDMFs), and functions of the CDMFs have been discussed for their use as a magnetic shutter or filter 11) for plasma confinement and modulation to reduce the damage of materials processed.…”

Stochastic electron energy gain under sheath electric field near sidewall of chamber to drive inductively coupled magnetized plasmas

“…Magnetic fields have been applied to ICPs in order to give some additional values. For example, neutral loop discharge (NLD) plasmas 1,2) magnetized by three coaxial dc coils achieve high-throughput etching with its high ion density and uniform processing by controlling magnetic fields dynamically, 3,4) and X-point plasmas driven under confronting divergent magnetic fields, originally developed for negative ion sources, can confine electrons in the plasma enhancement region. [5][6][7][8] We focus on the plasma flow controllability through the adjustment of coil currents inducing the magnetic fields.…”