Artificial Superhydrophobic and Antifungal Surface on Goose Down by Cold Plasma Treatment

Abstract

Plasma treatment, especially cold plasma generated under low pressure, is currently the subject of many studies. An important area using this technique is the deposition of thin layers (films) on the surfaces of different types of materials, e.g., textiles, polymers, metals. In this study, the goose down was coated with a thin layer, in a two-step plasma modification process, to create an artificial superhydrophobic surface similar to that observed on lotus leaves. This layer also exhibited antifungal properties. Two types of precursors for plasma enhanced chemical vapor deposition (PECVD) were applied: hexamethyldisiloxane (HMDSO) and hexamethyldisilazane (HMDSN). The changes in the contact angle, surface morphology, chemical structure, and composition in terms of the applied precursors and modification conditions were investigated based on goniometry (CA), scanning electron microscopy (SEM), Fourier-transform infrared spectroscopy in attenuated total reflectance mode (FTIR-ATR), and X-ray photoelectron spectroscopy (XPS). The microbiological analyses were also performed using various fungal strains. The obtained results showed that the surface of the goose down became superhydrophobic after the plasma process, with contact angles as high as 161° ± 2°, and revealed a very high resistance to fungi.

Comparative analysis of hexamethyldisiloxane and hexamethyldisilazane plasma polymer thin films before and after plasma oxidation

“…Similar to the oxidized HMDSO PP film, the high oxidation state of Si is also seen in the oxidized HMDSN PP film corresponding to SiO 2 at 103.2 eV. A second, weak component at 101.8 eV is associated to (-C-) 2 Si(-O-) 2 /Si-N. [18,44,45] The C1s peak was fitted by three components at 285, 286.5, and 289.1 eV, corresponding to the C-C/C-H, C-O/C-N, and C═O, respectively. [14,50] A small amount of N was detected and the N1s peak has three components (Si-N, C-N, and N-O).…”

“…The corresponding Si2p 3/2 peak shows a component of SiO 2 at 103.2 eV and a weak component of (-C-) 2 Si(-O-) 2 at 102.2 eV. [44,45] The C1s peak was fitted using three components at 285, 286.1, and 289.1 eV, corresponding to C-C/C-H, C-O, and C═O, respectively. [45,50] The O1s peak shows three components at 530.9, 532.7, and 533.8 eV, which are assigned to C═O, Si-O, and C-O, respectively.…”

“…[44,45] The C1s peak was fitted using three components at 285, 286.1, and 289.1 eV, corresponding to C-C/C-H, C-O, and C═O, respectively. [45,50] The O1s peak shows three components at 530.9, 532.7, and 533.8 eV, which are assigned to C═O, Si-O, and C-O, respectively. [46-49, 51, 52] Figure 2a shows the IRRAS data in the range of 3800-700 cm −1 for the HMDSO PP before and after plasma oxidation.…”

“…[31] The Si2p peak was fitted by two components at 102.0 and 102.9 eV, corresponding to (-C-) 2 Si(-O-) 2 /Si-N and (-C-)Si(-O-) 3 groups, respectively. [18,44,45,61] The C1s peak was fitted using two components, with the component at 285 eV assigned to C-C/C-H and another at 286.4 eV, assigned to C-O/C-N groups. [14,49] The N1s peak has two components at 398.8 and 400.0 eV, assigned to Si-N and C-N groups, respectively.…”

Anti-Mold Protection of Textile Surfaces with Cold Plasma Produced Biocidal Nanocoatings

“…This work is part of a broader research program aimed at the comprehensive improvement of the properties of high-mountain equipment. Within the framework of the program, the production of superhydrophobic surfaces on fabrics [ 33 , 34 ], which are used to make down suits, jackets, and sleeping bags, as well as the production of superhydrophobic down [ 35 , 36 ], have already been developed using plasma methods. However, the problem of protecting the above-mentioned products against mold growth still remained to be solved.…”