2000
DOI: 10.1103/physrevb.61.10832
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Assessment of effective-medium theories in the analysis of nucleation and microscopic surface roughness evolution for semiconductor thin films

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Cited by 264 publications
(155 citation statements)
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“…In the particular case of top layer roughness, an EMA is used with identical volume proportion of both the top layer and voids. 22 …”
Section: The Bruggeman Approximationmentioning
confidence: 99%
“…In the particular case of top layer roughness, an EMA is used with identical volume proportion of both the top layer and voids. 22 …”
Section: The Bruggeman Approximationmentioning
confidence: 99%
“…In that case, however, expressions (12) and (13) do not hold since  effR may depend also on  1I . It must be mentioned that for strong absorption regions, different EMTs, lead to different compositional dependences of the real and imaginary parts of the dielectric function [19].…”
Section: Theorymentioning
confidence: 99%
“…Nanocrystalline Si:H (nc-Si:H), denoted by  is represented by a model using a parametric critical point structure based on the joint density of states. 7 The optical properties of the components of the surface roughness layer are represented by a Bruggeman effective medium approximations 8 (EMA) consisting of variable fractions of bulk…”
Section: Spectroscopic Ellipsometrymentioning
confidence: 99%