ASUR : plateforme d'applications des sources laser ultra-rapides pour l'imagerie X et l'interaction laser-matière

Utéza, O.; Blandin, Pierre; Charmasson, L.; Coustillier, G.; Grojo, David; Kabashin, Andrei V.; Lebugle, Maxime; Sanner, N.; Tcheremiskine, V.; Sentís, M.; Légaré, François; Kieffer, Jean‐Claude

doi:10.1051/uvx/201301004

Cited by 4 publications

(3 citation statements)

References 8 publications

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“…The damage and ablation test-bench uses the ASUR laser infrastructure (Applications des Sources Ultra-Rapides) of LP3 laboratory [23]. The ASUR platform is a multiline femtosecond laser source based on Ti:Sapphire and Chirped Pulse Amplification technology (Amplitude Technologies, France).…”

Section: Experimental Arrangement Of the Damage And Ablation Testbenchmentioning

confidence: 99%

Handling beam propagation in air for nearly 10-fs laser damage experiments

Pasquier

Blandin

Clady

et al. 2015

Optics Communications

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Section: Experimental Arrangement Of the Damage And Ablation Testbenchmentioning

confidence: 99%

Handling beam propagation in air for nearly 10-fs laser damage experiments

Pasquier

Blandin

Clady

et al. 2015

Optics Communications

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“…Laser pulses were supplied by the ASUR laser system at the laboratory LP3 in Marseille [8], producing 800 nm pulses at a repetition rate of 100 Hz, and a duration of ~ 27 fs for the beam line used in this experiment. To limit pulse dispersion, a 90° off-axis parabola with a focal length of 15 mm was chosen for beam delivery to the sample, resulting in an equivalent NA of 0.25 for an input beam diameter of ~8 mm and a measured spot size of 3 μm.…”

Section: A Laser Setup and Exposure Conditionsmentioning

confidence: 99%

Laser-induced densification of fused silica using spatially overlapping sub-30 fs pulses

McMillen

Utéza

Clady

et al. 2020

Journal of Applied Physics

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Over the past several years, non-ablative femtosecond laser exposure with spatially overlapping (i.e. spatially cumulative) pulses has emerged as a key process in three-dimensional writing of patterns in bulk of dielectric substrates. When temporally non-cumulative and combined with post-processing steps, this process defines a novel manufacturing technique in fused silica, finding use in a broad number of applications, including -but not limited to -micromechanics, integrated optics, microelectronics, microfluidics, information storage, and combinations of these fields for novel integrated sensing applications.For fused silica, evidence has shown that there is a pulse-length duration threshold around 200 fs, marking the boundary between two radically different characteristic material modification regimes, each leading to a specific application. Pulsewidths below 200 fs lead to localized densification, enabling the direct-write of optical waveguides, while pulse-widths above this value produce self-organized nanostructures causing a localized volume expansion and enhanced etching susceptibility to various chemicals. Here, we focus our attention on the regime below 200 fs, using low repetition rate, temporally noncumulative pulses. In particular, we use very short pulses, i.e. in the range of 30 fsa regime as yet unexplored from the viewpoint of spatially cumulative modifications. Our goal is to understand how structural modifications obtained by overlapping pulses evolve with varying pulse overlap, and how shorter pulse duration may correlate with higher material densification. This knowledge is particularly important for the next generation of photonics devices, where increasing the level of laser-induced densification is a key factor for high-density photonic integration.

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“…The experimental studies were performed using laser beams of mJ energy level produced by front end systems of the PW-class laser "PEARL (Institute of Applied Physics of RAS, Nizhny Novgorod) [2] and of the platform for ultra-short laser applications "ASUR" (LP3 Laboratory, Marseille) [3]. PEARL laser system is developed at the institute and is capable of producing up to 0.56 PW peak power in a pulse of down to 43 fs duration at 910 nm wavelength.…”

Section: Introductionmentioning

confidence: 99%