Atomic layer deposition for nanostructured Li-ion batteries

Abstract

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Metal Fluorides as Lithium-Ion Battery Materials: An Atomic Layer Deposition Perspective

“…Despite these effects, the AlF3 growth rate remained constant with different cycle numbers at all temperatures studied (Figure 15b) [156]. ToF-ERDA measurements revealed that the films Similar to the methodology of using TiF 4 or TaF 5 as fluorine sources, Mane et al have reported on the deposition of LiF using LiO t Bu and either WF 6 or MoF 6 as the fluorine source [152]. Film growth took place between 150 and 300 • C, with amorphous films being deposited at the lowest temperature.…”

“…LISICON (lithium superionic conductor) materials, on the other hand, are mixtures of lithium silicates or germanates, lithium phosphates or vanadates and lithium sulphates and can produce similar conductivities as the NASICON structures [32]. In addition to these material classes, oxides such as Li 6 BaLa 2 Ta 2 O 12 with the garnet structure have been studied extensively and shown to have reasonable ionic conductivities [31]. Another benefit of the garnet materials is their high chemical stability in contact with the electrodes [32].…”

“…In this work, SF 6 was used because it is stable and non-toxic. Inductively coupled SF 6 plasmas contain species such as F, F 2 , SF 5+ and F − with S and S + as minor components. The AlF 3 deposition showed saturation with both TMA and the plasma with good film uniformity and conformality.…”

“…Alloying anodes have presented challenges in battery fabrication, because large volume changes associated with the alloying reactions can lead to electrode pulverization and degradation. However, with recent advances in nanofabrication, these problems might soon be mitigated by the use of proper micro-and nanoscale battery constructions [6][7][8][9][10].…”

Employing Synergetic Effect of Doping and Thin Film Coating to Boost the Performance of Lithium-Ion Battery Cathode Particles

“…ALD is best known for its ability to deposit high-quality, ultra thin conformal films of materials based on alternating dosing of chemical vapors that react with surfaces13141516. ALD ensures control of film thickness at nanometer level.…”