Atomic layer deposition of lithium containing thin films

Putkonen, Matti; Aaltonen, Titta; Alnes, Mari; Sajavaara, Timo; Nilsen, Ola; Fjellvåg, Helmer

doi:10.1039/b913466b

Cited by 87 publications

(108 citation statements)

References 24 publications

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“…Recently, the fi rst successful deposition of lithium containing fi lms (Li 2 CO 3 and lithium lanthanum titanate) was shown. [ 235 ] ALD has the major advantage that it is a technique capable of step conformal deposition in high-aspect ratio 3D geometries. The main disadvantage is that the growth rate for ALD processes in general is relatively low (typically 0.05 nm/cycle).…”

Section: Arrays Of Interdigitated Carbon Microrodsmentioning

confidence: 99%

All‐Solid‐State Lithium‐Ion Microbatteries: A Review of Various Three‐Dimensional Concepts

Oudenhoven

Baggetto

Notten

2010

Advanced Energy Materials

702

638

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With the increasing importance of wireless microelectronic devices the need for on-board power supplies is evidently also increasing. Possible candidates for microenergy storage devices are planar all-solid-state Li-ion microbatteries, which are currently under development by several start-up companies. However, to increase the energy density of these microbatteries further and to ensure a high power delivery, three-dimensional (3D) designs are essential. Therefore, several concepts have been proposed for the design of 3D microbatteries and these are reviewed. In addition, an overview is given of the various electrode and electrolyte materials that are suitable for 3D all-solidstate microbatteries. Furthermore, methods are presented to produce fi lms of these materials on a nano-and microscale.www.MaterialsViews.com REVIEW www.advenergymat.de

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Section: Arrays Of Interdigitated Carbon Microrodsmentioning

confidence: 99%

All‐Solid‐State Lithium‐Ion Microbatteries: A Review of Various Three‐Dimensional Concepts

Oudenhoven

Baggetto

Notten

2010

Advanced Energy Materials

702

638

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“…AA-CVD aerosol-assisted chemical vapor deposition acac acetylacetonate ALD atomic layer deposition bipy 2,2 ′ -bipyridine CVD chemical vapor deposition dik β-diketonate EDX energy dispersive X-ray spectroscopy fod 2,2-dimethyl- 6,6,7,7,8,8,8-heptafluorooctane-3,5-dionate hfac 1,1,1,5,5,5-hexafluoroacetylacetonate ITO indium tin oxide dielectric constant LED light emitting diode MOCVD metal-organic chemical vapor deposition PA-LICVD plasma-assisted liquid-injection chemical vapor deposition ptac 2,2-dimethyl-6,6,6-trifluoro-3,5-hexanedionate RMS root mean square scCO 2 supercritical carbon dioxide SEM scanning electron microscopy TEM transmission electron microscopy tfac 1,1,1-trifluoroacetylacetonate thd 2,2,6,6-tetramethyl-3,5-heptanedionate tmeda N,N,N ′ ,N ′ -tetramethylethylenediamine UV ultraviolet XRPD X-ray powder diffraction YSZ yttria-stabilized zirconia…”

Section: Abbreviations and Acronymsmentioning

confidence: 99%

“…In follow-up works, it was shown that α-Al 2 O 3 films could be selectively deposited with (0 0 1) and (0 0 6) orientation in either an argon-oxygen atmosphere or in the presence of carbon dioxide-hydrogen 42,43 . In the laser-assisted CVD of 2 ], where O ∩ N is an anion resulting from OH deprotonation in enols 6-11. These complexes are more stable than [Al(OBu-t) 3 ] 2 and AlMe 3 , and hence can be better used as precursors in deposition experiments.…”

Section: Group 13 Elements (Al Ga In)mentioning

confidence: 99%

“…The as-obtained films were amorphous even at high substrate temperature, but could be converted into monoclinic β-Ga 2 O 3 upon sintering at 1000 ∘ C 51 . which was explained according to the qualitative model in Figure 3 52 2 ] in the AA-CVD of gallium-doped ZnO thin films (horizontal cold-wall tubular reactor, solvent methanol, Ga/Zn atomic ratio 3%, temperature 400-450 ∘ C, growth rate 3.1-5.7 nm min -1 , layer thickness 170-750 nm) 55,56 . Gallium concentrations of 0.4 and 2.1 at% were obtained at 400 and 450 ∘ C, respectively, in the vapor deposition process.…”

Section: Group 13 Elements (Al Ga In)mentioning

confidence: 99%

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Advances in Deposition of Main‐Group Metal Oxides and Rare‐Earth Oxides from Metal Enolates

Lang

Adner

Georgi

2016

Patai's Chemistry of Functional Groups

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This chapter is an update of a review published by our group elsewhere in Patai's Series; in addition, in this volume, chapters present the recent advances in the deposition of metals and transition‐metal oxides, all derived from metal enolates. Materials featuring group 3 ‐ 12 elements have attracted great technological and scientific attention during the last decades because of their outstanding chemical and physical properties. They are widely used in industry, including a variety of catalyst supports, coatings, as dielectrics for semiconducting devices, and as sensors.

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“…Examples of binary oxide electrodes (specifically V 2 O 5 and TiO 2 ) and lithium containing materials are presented. Lithium containing materials are quite a new addition to the ALD materials toolbox-the first paper on the subject was published in 2009 [70]. Since then, this area of research has expanded very rapidly.…”

Section: Atomic Layer Deposition Of Conventional Lithium-ion Battery mentioning

confidence: 99%

Metal Fluorides as Lithium-Ion Battery Materials: An Atomic Layer Deposition Perspective

2018

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Lithium-ion batteries are the enabling technology for a variety of modern day devices, including cell phones, laptops and electric vehicles. To answer the energy and voltage demands of future applications, further materials engineering of the battery components is necessary. To that end, metal fluorides could provide interesting new conversion cathode and solid electrolyte materials for future batteries. To be applicable in thin film batteries, metal fluorides should be deposited with a method providing a high level of control over uniformity and conformality on various substrate materials and geometries. Atomic layer deposition (ALD), a method widely used in microelectronics, offers unrivalled film uniformity and conformality, in conjunction with strict control of film composition. In this review, the basics of lithium-ion batteries are shortly introduced, followed by a discussion of metal fluorides as potential lithium-ion battery materials. The basics of ALD are then covered, followed by a review of some conventional lithium-ion battery materials that have been deposited by ALD. Finally, metal fluoride ALD processes reported in the literature are comprehensively reviewed. It is clear that more research on the ALD of fluorides is needed, especially transition metal fluorides, to expand the number of potential battery materials available.

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Atomic layer deposition of lithium containing thin films

Cited by 87 publications

References 24 publications

All‐Solid‐State Lithium‐Ion Microbatteries: A Review of Various Three‐Dimensional Concepts

All‐Solid‐State Lithium‐Ion Microbatteries: A Review of Various Three‐Dimensional Concepts

Advances in Deposition of Main‐Group Metal Oxides and Rare‐Earth Oxides from Metal Enolates

Metal Fluorides as Lithium-Ion Battery Materials: An Atomic Layer Deposition Perspective

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