Atomic force microscopy (AFM) is a powerful measurement tool, widely used in microfabricated structure inspection. However, since it is typical that the fixed tilting angle of a probe is employed in traditional AFM, the corner and sidewall image of the scanned sample would be distorted. To overcome the problem, a so-called adaptive tilting angle algorithm (ATAA) applied to a self-designed dual-probe AFM system is presented to achieve on-line sidewall estimation during scanning of general samples. Through the use of the proposed ATAA, the tilting angles of dual probes for each scan line can be selfadjusted to the optimal ones. Overall, a probe tilt mechanism is designed, which allows the AFM system to change the tilting angles of the probes during the scanning process such that the dual-probe structure AFM can acquire a complete high precision image with just a single scan. The experimental results show the performance of sidewall measurement and the high-precision image obtained by the proposed method.