Gallium phosphide nanowires (NWs) doped by zinc were prepared on (111)B GaP substrates by low‐pressure metal‐organic vapor phase epitaxy using 30 nm Au seed particles. The NWs were transferred onto SiO2/Si substrate. Single NWs were processed into two‐ and four‐probe back‐gated devices electrically contacted via low‐resistance ohmic contacts, formed by evaporation of Au + Zn alloy that was annealed at 400 °C. The device topology was defined using electron beam lithography (EBL) and lift‐off. The NW electrical properties were evaluated from I–V characteristics measured for various gate voltages. The measurement gave evidence that the NW were p‐type. The NW resistivity and hole concentration were between 0.254 and 0.325 Ωcm, and 0.9–1.5 × 1018 cm−3, respectively.