2012
DOI: 10.1109/tps.2012.2190526
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Ballistic-Mode Plasma-Based Ion Implantation for Surface-Resistivity Modification of Polyimide Film

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Cited by 9 publications
(8 citation statements)
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“…For this reason, many researchers have used fluid simulations [11,12] or particle-in-cell (PIC) simulations [13][14][15][16][17] to investigate these configurations. Although sheath expansions of many configurations of geometries like sharp edges [11,13] and trenches [12,15] have been studied using simulations, sheath expansion of grid electrode which is very commonly used in basic plasma studies [18] and practical plasma processes [19][20][21][22][23] has not been studied yet.…”
Section: Introductionmentioning
confidence: 99%
“…For this reason, many researchers have used fluid simulations [11,12] or particle-in-cell (PIC) simulations [13][14][15][16][17] to investigate these configurations. Although sheath expansions of many configurations of geometries like sharp edges [11,13] and trenches [12,15] have been studied using simulations, sheath expansion of grid electrode which is very commonly used in basic plasma studies [18] and practical plasma processes [19][20][21][22][23] has not been studied yet.…”
Section: Introductionmentioning
confidence: 99%
“…For deeper traps, more energy is needed to detrap the carriers, which means more charges are trapped in samples. Only the near surface region with the depth about ~90 nm of the material has been modified by reactive groups during plasma treatment [34]. Thus, the trap distribution modification mainly occurs in the near surface region, by introducing groups contained oxygen and nitrogen.…”
Section: Modification Mechanismmentioning
confidence: 99%
“…In many cases, the ion distributions near the surface of electrodes were mainly studied for industrial applications such as the modification of the surface properties of materials using energetic ions. However, for grid electrodes, which are frequently used in basic plasma research [17] and industrial plasma applications [14,15,18,19], ion distributions in the entire region of an expanding sheath are important for investigating the characteristics of sheath expansion [20] and pseudo wave generation [17].…”
Section: Introductionmentioning
confidence: 99%
“…In applications of plasma immersion ion implantation [3] for insulating materials, grid electrodes have been used to suppress charge accumulations on the surface of the insulating materials during the process [15,18,19]. In some cases, insulating materials were located inside the expanded sheath of the grid electrodes [15,18] and the number and energy of implanted ions in the surface of the insulating material are determined by the ion distribution inside the expanded sheath of the grid electrodes.…”
Section: Introductionmentioning
confidence: 99%
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