2020
DOI: 10.1016/j.jcrysgro.2020.125602
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Band edge thermometry for the MBE growth of (Hg,Cd)Te-based materials

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Cited by 11 publications
(5 citation statements)
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“…In the III-V chamber, Ga is supplied for 2 min at a beam equivalent pressure of about 4 × 10 −8 mbar from an effusion cell at a substrate temperature of 250 • C. Solid-state diffusion of Ga into the Au disks results in the formation of Au-Ga alloy droplets with a melting temperature of about 350 • C. Upon transferral into the II-VI chamber, the substrates are heated in a stabilizing Zn flux to the growth temperature of 440-450 • C, well above the melting point of the Au-Ga alloy. The temperature is monitored by band edge thermometry [9,10], which allows us to adjust the temperature of the substrate surface with high precision and reliability. ZnTe nanowires are grown using beam-equivalent pressures in the range of 1-2 × 10 −6 mbar and a Zn : Te ratio of 0.6-0.7 at a constant substrate temperature.…”
Section: Methodsmentioning
confidence: 99%
“…In the III-V chamber, Ga is supplied for 2 min at a beam equivalent pressure of about 4 × 10 −8 mbar from an effusion cell at a substrate temperature of 250 • C. Solid-state diffusion of Ga into the Au disks results in the formation of Au-Ga alloy droplets with a melting temperature of about 350 • C. Upon transferral into the II-VI chamber, the substrates are heated in a stabilizing Zn flux to the growth temperature of 440-450 • C, well above the melting point of the Au-Ga alloy. The temperature is monitored by band edge thermometry [9,10], which allows us to adjust the temperature of the substrate surface with high precision and reliability. ZnTe nanowires are grown using beam-equivalent pressures in the range of 1-2 × 10 −6 mbar and a Zn : Te ratio of 0.6-0.7 at a constant substrate temperature.…”
Section: Methodsmentioning
confidence: 99%
“…Even an insignificant deviation of temperature from the optimum value may give rise to imperfections of the crystal structure: formation of threading defects [10], disengagement of phases of different composition [11], development of roughness of the growth surface [6], and other unwanted effects. Temperature monitoring in the process of growth is a highly topical problem in CMT MBE technology and attracts considerable attention [12][13][14][15][16][17][18]. In addition to affecting the epitaxy process, uncontrolled temperature variation makes it difficult to determine the composition accurately using the ellipsometry method.…”
Section: Introductionmentioning
confidence: 99%
“…В значительной мере это касается контроля технологических процессов молекулярно-лучевой эпитаксии (МЛЭ) гетероструктур на основе теллуридов кадмия и ртути (КРТ). Эллипсометрия используется для определения состава слоeв в процессе роста [1][2][3][4][5], их структурного совершенства [6,7], скорости роста [6,8], температуры ростовой поверхности [9][10][11]. Проблема измерения температуры в условиях сложного лучистого теплообмена является непростой задачей и крайне актуальна для низкотемпературного синтеза слоeв КРТ.…”
Section: Introductionunclassified