2013
DOI: 10.1016/j.ssc.2013.04.013
|View full text |Cite
|
Sign up to set email alerts
|

Band gap tuning in HgTe through uniaxial strains

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1

Citation Types

0
1
0

Year Published

2014
2014
2019
2019

Publication Types

Select...
2

Relationship

0
2

Authors

Journals

citations
Cited by 2 publications
(1 citation statement)
references
References 31 publications
0
1
0
Order By: Relevance
“…HgTe can be grown epitaxially on CdTe due to the close match in lattice constants (0.3% mismatch). The tensile strain induced by this lattice mismatch is instrumental in bulk layers, where it lifts the degeneracy of the Γ 8 bands and opens a band gap [4][5][6] such that the toplogical insulator state can be accessed. 3 We showed, recently, that it is possible to grow CdTe-HgTe nanowire structures, 7 which are expected to show some residual strain.…”
Section: Introductionmentioning
confidence: 99%
“…HgTe can be grown epitaxially on CdTe due to the close match in lattice constants (0.3% mismatch). The tensile strain induced by this lattice mismatch is instrumental in bulk layers, where it lifts the degeneracy of the Γ 8 bands and opens a band gap [4][5][6] such that the toplogical insulator state can be accessed. 3 We showed, recently, that it is possible to grow CdTe-HgTe nanowire structures, 7 which are expected to show some residual strain.…”
Section: Introductionmentioning
confidence: 99%