Photocapacitance measurements in the photon energy range of 0.64 to 1.27 eV are done on GaAs layers grown by liquid phase epitaxy (LPE) and doped with varying amounts of indium (In) and antimony (Sb). Two hole traps with optical ionization energies of 0.65 and 0.79 eV are revealed in thc material which are assumed to be two levels associated with the hole trap B reported in the literature. In addition, the hole trap A, usually found in LPE GaAs is also detected here by optical deep level transient spectroscopy (ODLTS) technique. The results of trap density measurements, as functions of isoelectronic doping Concentration, indicate that V, , is an active constituent of the hole traps in LPE GaAs. The concentration of the 0.79 eV trap is found to be reduced in the material with high concentration of Sb. The analysis of photocapitance data using the existing theoretical models indicates the presence of an electron trap with activation energy of 0.75 eV in the heavily Sb-doped material. This trap may be identified with the second charge state of the Sbca electron trap, obtained previously in bulk and metalorganic vapor phase epitaxial GaAs doped with Sb. The sharp reduction of the 0.79 eV hole trap density in Sb-doped materials is explained by assuming the complex Ga,,V&, as its source.