1997
DOI: 10.1016/s0038-1098(97)00151-8
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Bistable electroluminescence of tunneling silicon MOS structures

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Cited by 7 publications
(5 citation statements)
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“…150 mA, the efficiency of the Si : P diodes is estimated as gh % (1-3) Â 10 --3 . At the diode current J 0 ¼ 200 mA, the integral intensity of the EHline is much higher than the integral intensity of electroluminescence of free excitons observed in the same diodes at the temperature T ¼ 140 K [14][15][16]. The energy gap temperature that is quite different from the diode temperature, the optical hysteresis in the intensity-current dependence, and the very high quantum efficiency of the luminescence can be explained by condensation of the injected electron-hole plasma in the Si : P diodes into a dense surface state.…”
Section: Methodsmentioning
confidence: 75%
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“…150 mA, the efficiency of the Si : P diodes is estimated as gh % (1-3) Â 10 --3 . At the diode current J 0 ¼ 200 mA, the integral intensity of the EHline is much higher than the integral intensity of electroluminescence of free excitons observed in the same diodes at the temperature T ¼ 140 K [14][15][16]. The energy gap temperature that is quite different from the diode temperature, the optical hysteresis in the intensity-current dependence, and the very high quantum efficiency of the luminescence can be explained by condensation of the injected electron-hole plasma in the Si : P diodes into a dense surface state.…”
Section: Methodsmentioning
confidence: 75%
“…(b) 232, No. 2 (2002) Electroluminescence spectra of two-dimensional carriers at a silicon surface in the diodes at T ¼ 1:5 K [ [14][15][16] show that the surface quantum well in the diodes is deep, and screening of an electrical field at a silicon surface should be nearly quantum at room temperature and densities of surface carriers n s % (1-3) Â 10 13 cm --2 . However, the density of carriers at upper quantum levels in the surface potential well can be relatively high at room temperatures.…”
Section: Tunneling Silicon Mos Diodesmentioning
confidence: 99%
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“…2, middle, spectrum 2) is observed as well as the recombination radiation line of 2D electrons and 2D injected holes in Si : P tunneling MOS diodes (Fig. [1]. The Si : B diodes were fabricated on p-type silicon substrates with the boron concentration n A = 8 Â 10 20 m ±3 .…”
Section: Resultsmentioning
confidence: 99%
“…Introduction Recent investigations of electroluminescence and current instabilities of tunneling silicon MOS diodes show that a dense two-dimensional (2D) electron layer, screening an electrical field, and an additional 2D hole layer are formed at a silicon surface under tunneling injection of holes into a selforganized hole quantum well [1,2]. The recombination radiation line (S-line) of 2D electrons and 2D injected holes is observed [1,2].…”
mentioning
confidence: 99%