“…With proper parameter settings the two most commonly used fluorine-based DRIE methods, the so-called Bosch-process and also the cryogenic or mixed-mode result in the formation of b-Si Jansen, 2009;Jansen, 2010]. Reactive ion etching (RIE) in CF 4 [Gharghi, 2006], in Cl 2 [Kalem, 2011] or SF 6 plasma [Stubenrauch, 2006;Yoo, 2006;Dorrer, 2008;Hoyer, 2008] have been used to realize Si nanograss. Wet chemistry based on the local catalytic action of nanometer-sized Au dots [Koynov, 2006 or laser direct writing [Serpenguzel, 2008;Barberoglou, 2010;Vorobyev, 2011] have also been reported as a reliable tool for Si nanograss formation.…”