Defective few-layered graphene mesostructures
(DFLGMs) are produced
from graphite flakes by high-energy milling processes. We obtain an
accurate control of the generated mesostructures, as well as of the
amount and classification of the structural defects formed, providing
a functional material for microwave absorption purposes. Working under
far-field conditions, competitive values of minimum reflection loss
coefficient (RLmin) = −21.76 dB and EAB = 4.77 dB
are achieved when DFLGMs are immersed in paints at a low volume fraction
(1.95%). One step forward is developed by combining them with the
excellent absorption behavior that offers amorphous Fe73.5Si13.5B9Cu1Nb microwires (MWs),
varying their filling contents, which are below 3%. We obtain a RLmin improvement of 47% (−53.08 dB) and an EAB enhancement
of 137% (4 dB) compared to those obtained by MW-based paints. Furthermore,
a f
min tunability is demonstrated, maintaining
similar RLmin and EAB values, irrespective of an ideal
matching thickness. In this scenario, the Maxwell-Garnet standard
model is valid, and dielectric losses mainly come from multiple reflections,
interfacial and dielectric polarizations, which greatly boost the
microwave attenuation of MWs. The present concept can remarkably enhance
not only the MW attenuation but can also apply to other microwave
absorption architectures of technological interest by adding low quantities
of DFLGMs.