1999 IEEE MTT-S International Microwave Symposium Digest (Cat. No.99CH36282)
DOI: 10.1109/mwsym.1999.779419
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CAD-oriented equivalent circuit modeling of on-chip interconnects for RF integrated circuits in CMOS technology

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Cited by 12 publications
(12 citation statements)
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“…For relatively low bulk resistivities of the silicon substrate on the order of 0.01 -cm (e.g., in some analog CMOS processes), the and parameters typically exhibit significant variation in the low gigahertz range while and remain relatively flat up to frequencies of tens of gigahertz. In contrast, for medium-to-high resistivity substrates on the order of 10 -cm, both and vary significantly in the low gigahertz range while is nearly constant up to frequencies of tens of gigahertz [13], [14].…”
Section: Introductionmentioning
confidence: 87%
“…For relatively low bulk resistivities of the silicon substrate on the order of 0.01 -cm (e.g., in some analog CMOS processes), the and parameters typically exhibit significant variation in the low gigahertz range while and remain relatively flat up to frequencies of tens of gigahertz. In contrast, for medium-to-high resistivity substrates on the order of 10 -cm, both and vary significantly in the low gigahertz range while is nearly constant up to frequencies of tens of gigahertz [13], [14].…”
Section: Introductionmentioning
confidence: 87%
“…In order to prove the validity of the given approach self and mutual per unit length shunt admittance (capacitance and conductance per unit length) calculated using our procedure are compared with the results of the full-wave analysis (spectral domain approach) and with those obtained by using equivalent-circuit modelling technique (Zheng et al, 1999). In Figure 5, an asymmetric coupled interconnect structure is depicted with the following electrical and geometrical parameters: d ¼ 500 mm; t ox ¼ 2 mm; w 1 ¼ 4 mm; w 2 ¼ 1 mm; T 1 ¼ T 2 ¼ 1 mm; 1 si ¼ 11:8; r si ¼ 0:01 V cm; 1 ox ¼ 3:9 and s ¼ 4 mm: Figure 6a shows the variation in the distributed self and mutual capacitance per unit length C 11 (v ), C 22 (v ), and C 12 (v ), as a function of the frequency.…”
Section: Asymmetric Coupled Interconnects On An Si -Sio 2 Substratementioning
confidence: 99%
“…It has been well established that the resistivity–frequency plane can be divided into main three regions: the dissipative dielectric region, the slow‐wave region, and the skin‐effect region. Recently quasi‐TEM analysis of coplanar structure has made the incorporation of metallic conductor and silicon substrate losses in the analysis possible and have provided a physical basis for the construction of equivalent circuits (Kwon et al , 1987; Zheng et al , 1999).…”
Section: Introductionmentioning
confidence: 99%
“…As a result, RF interconnects play an increasingly important role in RFICs [2]. To date, one of the limiting factors of RFIC designs is the absence of accurate interconnect models [3]. In the literature, most studies have focused on simple structures such as straight lines, doubleparalleled lines, and so forth [4 -7].…”
Section: Introductionmentioning
confidence: 99%
“…Quadrature and 180°hybrid couplers are used extensively in various microwave circuit applications [1][2][3]. In planar-circuit technology, most couplers are based on coupling by coupled line or branch line [1].…”
Section: Introductionmentioning
confidence: 99%