Calculation of intrinsic stresses in the diamond-like coatings produced by plasma ion deposition in modes of DC and pulse bias potentials

Optimization of Diamond-Like Carbon Coatings for Mechanical and Tribological Applications. Review

“…Different approaches are used here. First, stress relief, which is necessary for the synthesis of thick coatings, is achieved thanks to ion-induced thermal annealing when high-voltage pulses are applied to the substrate [77][78][79][80][81][82][83][84][85][86][87]. On the other hand, a similar effect can be achieved by alternating more stressed hard and less stressed soft layers.…”

“…For example, with an amplitude of 1000 V pulses with a duration of 5 μs, increasing the frequency from 0 to 200 kHz leads to a linear decrease in the stresses in the coatings from 8.5 to 0.5 GPa, but at frequencies above 130 kHz, the trajectory of the ion peaks on the phase P,T diagram go beyond the stability region of diamond, which evidences the graphitization of the coating [86]. In addition, the important role of the deposition temperature in controlling the internal stresses in the deposited coating is noted [87].…”

Influence of the Inert Gas Pressure on Intrinsic Stress in Diamond-Like Coating Deposited From Vacuum Arc Carbon Plasma

“…When deriving the formula for intrinsic stress, basically, the line of reasoning used in works [6][7][8][9] is repeated. At this, the model of a nonlocal thermal peak (NTP) of a low-energy ion is widely used -an overheated and overstressed nanometer region near the ion trajectory in the target material, in which thermalized phonon losses of the ion contain [10].…”

“…It is assumed that intrinsic stresses are formed as a result of two simultaneous but oppositely directed processes: 1) stress generation due to implantation of the incident ion beam and 2) stress relaxation due to thermally activated processes of defect migration in the NTP of ions [6]. In addition, the stated model [7][8][9], like the Davis's one [6], is based on the hypothesis of proportionality between the density of defects formed as a result of ion scattering by target atoms and the volumetric deformation of the target.…”

“…was used [13]. In this work, the defect formation functions are calculated numerically using the SRIM2000 program code [9,11] (see Fig. 4).…”