Calixarenes-prospective materials for nanofabrications-

Novel Molecular Resist for EUV and Electron Beam Lithography

“…The potential benefit of a small base unit with monodisperse size distribution in terms of dissolution uniformity and hence lower LER has been explored in several different molecule designs. Chemically amplified resists (CARs) using molecules such as calixarenes [1], noria [2], epoxide [3], xanthendiol [4] or fullerenes [5] have been developed to investigate this material class. In addition to these organic molecular resists, recently a non-chemically amplified material consisting of organometallic molecules has been presented [6].…”

Preparation and properties of calix[4]arene-based epoxy resins

“…Thus it seems promising to further enhance the sensitivity of calixarene derivatives by applying various techniques, which are generally used to reduce the required dose of commonly used novolak resin. [15][16][17][18][19] Up to now, this method has not been applied to the non polymeric class of calixarenes. In the microelectronic process, the smallest obtainable structure size as well as the line edge roughness is strongly influenced by the size of the typical novolak based polymeric resist molecules.…”

Evaluation of calixarene—derivatives as high-resolution negative tone electron-beam resists

“…It has been shown previously that calixarenes and their derivatives can be used as negative tone electron-beam resists. 1,2 Calixarenes are a group of macrocyclic molecules in which phenolic units are linked via methylene bridges in ortho-position to the phenolic hydroxyl groups. They acquired their name because of the resemblance of the shape of one confomer ͑cone͒ of the smallest member of the family ͑calix͓4͔arene͒ to a type of Greek vase called ͑a͒ calix crater.…”

“…Hexachloromethyl-hexaacetoxycalix͓6͔arene with a practical area dose of about 0.7 mC/cm 2 at 50 kV has become a commonly used calixarene derivative for high-resolution e-beam exposures. 1,2,4 In order to further improve sensitivity and to learn something about the crosslinking mechanism, which has not been fully resolved up to now, we have started systematic studies on different calixarene derivatives with a focus on their sensitivities. Issues like etching resistance and high-resolution capabilities have also been examined.…”