Capillary force lithography: the versatility of this facile approach in developing nanoscale applications

Ho, Dominic; Zou, Jianli; Zdyrko, Bogdan; Iyer, K. Swaminathan; Luzinov, Igor

doi:10.1039/c4nr03565h

Cited by 50 publications

(32 citation statements)

References 100 publications

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“…The polymer melts and fills the voids between the polymer and the mold completely. [134,135] Then, when the stamp is removed from the substrate, the polymer pattern is fabricated. Because this method is based on capillary force, different height patterns can be created at the edges of the pattern depending on the amount of polymer and the shape of the pattern (Figure 4c).…”

Section: Edge-spreading Lithography and Modified Capillary Lithographymentioning

confidence: 99%

Recent Progress in Simple and Cost‐Effective Top‐Down Lithography for ≈10 nm Scale Nanopatterns: From Edge Lithography to Secondary Sputtering Lithography

et al. 2020

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The development of a simple and cost‐effective method for fabricating ≈10 nm scale nanopatterns over large areas is an important issue, owing to the performance enhancement such patterning brings to various applications including sensors, semiconductors, and flexible transparent electrodes. Although nanoimprinting, extreme ultraviolet, electron beams, and scanning probe litho‐graphy are candidates for developing such nanopatterns, they are limited to complicated procedures with low throughput and high startup cost, which are difficult to use in various academic and industry fields. Recently, several easy and cost‐effective lithographic approaches have been reported to produce ≈10 nm scale patterns without defects over large areas. This includes a method of reducing the size using the narrow edge of a pattern, which has been attracting attention for the past several decades. More recently, secondary sputtering lithography using an ion‐bombardment technique was reported as a new method to create high‐resolution and high‐aspect‐ratio structures. Recent progress in simple and cost‐effective top‐down lithography for ≈10 nm scale nanopatterns via edge and secondary sputtering techniques is reviewed. The principles, technical advances, and applications are demonstrated. Finally, the future direction of edge and secondary sputtering lithography research toward issues to be resolved to broaden applications is discussed.

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Section: Edge-spreading Lithography and Modified Capillary Lithographymentioning

confidence: 99%

Recent Progress in Simple and Cost‐Effective Top‐Down Lithography for ≈10 nm Scale Nanopatterns: From Edge Lithography to Secondary Sputtering Lithography

et al. 2020

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“…[18] Among these, NIL represents an attractive method for its possibility to scaling up and high-throughput. [19,14,20] A particular class of attractive hydrogel thin film materials are stimuliresponsive systems, which alter their swelling state in response to specific changes of the environment (temperature, pH, etc.). [21,22] Among responsive polymers, poly(Nisopropylacrylamide) (pNIPAAm) holds a prominent stage due to its strong swelling and collapsing that can be triggered by variations of temperature around its lower critical solution temperature (LCST ≈32 °C).…”

Section: Introductionmentioning

confidence: 99%

“…Hydrogel structures tethered to a solid support has been prepared by a range of techniques including photolithography, e‐beam lithography, nanoimprint lithography (NIL), laser interference lithography (LIL), and colloidal lithography . Among these, NIL represents an attractive method for its possibility to scaling up and high‐throughput . A particular class of attractive hydrogel thin film materials are stimuli‐responsive systems, which alter their swelling state in response to specific changes of the environment (temperature, pH, etc.)…”

Section: Introductionmentioning

confidence: 99%

Optical Waveguide‐Enhanced Diffraction for Observation of Responsive Hydrogel Nanostructures

Pirani

Sharma

Moreno-Cencerrado

et al. 2017

Macro Chemistry & Physics

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Optical diffraction measurements are reported for in situ observation of swelling and collapsing of responsive hydrogel nanostructures. The optical signal is enhanced by probing the surface carrying periodic arrays of hydrogel nanostructures by resonantly excited optical waveguide modes. UV-nanoimprint lithography is employed for the preparation of the arrays of nanopillars from photo-crosslinked N-isopropylacrylamide (pNIPAAm)-based hydrogel that are covalently tethered to a gold surface. The thermo-responsive properties of such pNIPAAm nanopillars that swell in 3D are compared to those of a thin film prepared from the identical material and that is allowed to swell predominantly in 1D. The nanopillars with a diameter of ≈100 nm and aspect ratio of 2 swell by a factor of ≈6 as determined by optical measurements supported by simulations that are compared to morphological characteristics obtained from atomic force microscopy. Bending of nanopillars above the lower critical solution temperature (LCST), erasure of the topographic structure by drying at temperature below the LCST, and recovery by subsequent swelling below the LCST and drying at temperature above the LCST are observed.

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“…Over the past decade, there has been increasing interest in micro-fabrication due to its ubiquitous use in the semiconductor industry, and other new applications, such as micro-fluidic devices, biosensors, tissue engineering, and drug delivery 1 2 3 4 5 6 7 8 9 10 11 . Photolithography is the most widely used conventional micro-fabrication technique 12 .…”

mentioning

confidence: 99%

Scalable lithography from Natural DNA Patterns via polyacrylamide gel

Hou

Fan

et al. 2015

Sci Rep

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A facile strategy for fabricating scalable stamps has been developed using cross-linked polyacrylamide gel (PAMG) that controllably and precisely shrinks and swells with water content. Aligned patterns of natural DNA molecules were prepared by evaporative self-assembly on a PMMA substrate, and were transferred to unsaturated polyester resin (UPR) to form a negative replica. The negative was used to pattern the linear structures onto the surface of water-swollen PAMG, and the pattern sizes on the PAMG stamp were customized by adjusting the water content of the PAMG. As a result, consistent reproduction of DNA patterns could be achieved with feature sizes that can be controlled over the range of 40%–200% of the original pattern dimensions. This methodology is novel and may pave a new avenue for manufacturing stamp-based functional nanostructures in a simple and cost-effective manner on a large scale.

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Capillary force lithography: the versatility of this facile approach in developing nanoscale applications

Cited by 50 publications

References 100 publications

Recent Progress in Simple and Cost‐Effective Top‐Down Lithography for ≈10 nm Scale Nanopatterns: From Edge Lithography to Secondary Sputtering Lithography

Recent Progress in Simple and Cost‐Effective Top‐Down Lithography for ≈10 nm Scale Nanopatterns: From Edge Lithography to Secondary Sputtering Lithography

Optical Waveguide‐Enhanced Diffraction for Observation of Responsive Hydrogel Nanostructures

Scalable lithography from Natural DNA Patterns via polyacrylamide gel

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