We have used photoluminescence up conversion to study the carrier capture times into intermixed InGaAs/GaAs quantum wells. We have found that the capture into the intermixed wells is markedly faster than capture into the reference ͑unintermixed͒ quantum wells. The reasons for the significant reduction in the capture time is related to the shape of the intermixed quantum well. Such a reduction in the capture time is beneficial both in terms of the quantum efficiency and the frequency response of intermixed optoelectronic devices. © 1998 American Institute of Physics.
͓S0003-6951͑98͒01849-X͔Quantum well intermixing ͑QWI͒ is a method of considerable recent interest due to its wide applicability in optoelectronics. 1 QWI is based on the modification of the shape of the quantum well, and allows the post growth adjustment of several key parameters, such as the effective band gap, the optical absorption coefficient, and the refractive index. This flexibility enables the monolithic integration of optoelectronic devices, such as lasers, modulators, waveguides, amplifiers, etc. onto a single chip. 2 QWI has also been used to fabricate blueshifted 3 and multiplewavelength laser diodes, low threshold lasers, and lasers with saturable absorbers, in addition to improving the performance of high power lasers. 1 In this letter, we shall show that in addition to modifying the quantum well parameters mentioned above, QWI can also have a significant impact on the carrier capture into ͑intermixed͒ quantum wells. We shall show that in intermixed InGaAs/GaAs quantum wells, the carrier capture is faster than in similar but nonintermixed quantum wells. This efficient carrier capture can explain the relatively high quantum efficiency of intermixed light emitting devices, and may also result in improved frequency response of optoelectronic devices in general. The carrier capture times were determined from time resolved photoluminescence measurements using the photoluminescence up-conversion technique.The photoluminescence ͑PL͒ up-conversion experiments 4 were performed using a femtosecond self-mode locked Ti:sapphire laser, using a LiIO 3 nonlinear crystal. The laser was tunable between 750 and 900 nm, the pulse width was 80 fs, the repetition rate 85 MHZ, and the output power was 200 mW at ϭ780 nm. The time resolution of our system was approximately 200 fs. The optically excited carrier concentration was approximately 4ϫ10 10 carriers/cm 2 . The samples were mounted in a variable temperature, closed cycle, He cryostat, the temperature of which could be varied between 8 and 300 K. In this study we shall discuss results obtained on a number of In x Ga 1Ϫx As/GaAs quantum well ͑QW͒ samples grown by metalorganic chemical vapor deposition. Each sample contained two QWs: a 5-nm-wide In 0.15 Ga 0.85 As well and a 5-nm-wide In 0.3 Ga 0.7 As well embedded between 50-nm-thick GaAs barriers. To achieve intermixing, we used room temperature proton implantation in combination with rapid thermal annealing ͑RTA͒. Details of the implantation conditions...