Carbon-Coated Tellurium for Optical Data Storage

Abbott, Jonathan; Niederhauser, T.L.; Hansen, David R.; Perkins, Raymond T.; Bell, David A.; Bard, E.; Lunt, Barry M.; Worthington, Mark; Miller, Christopher; Hyatt, Daniel; Asplund, Matthew C.; Jiang, Guilin; Linford, Matthew R.; Vanfleet, Richard; Davis, Robert C.

doi:10.1021/am100383j

Cited by 11 publications

(9 citation statements)

References 13 publications

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“…Nevertheless, thermal and electron beam vapor deposition systems are not well-suited for most industrial applications because their deposition rates (i) tend to be low and (ii) are strongly influenced by any variation in the temperature of the material being deposited through its vapor pressure. Rossnagel described the extent to which sputtering is employed in the semiconductor industry as follows: “[Sputtered] layers are used as diffusion barriers, adhesion or seed layers, primary conductors, antireflection coatings, and etch stops.” Sputtering has played a significant role in the manufacturing of almost every optical disc (CD, DVD, and Blu-ray) that has ever been made (many billions), where sputtered films include reflective layers, dielectric layers, and/or read/write (data storage) films. − As the third of many possible examples, series of sputtered coatings are regularly applied in very large vacuum systems to commercial window glass, often to improve its energy performance. Because sputtering has been widely used to create relatively inexpensive commercial products, we believe that it will be possible to manufacture sputtered SPME coatings in an economical fashion.…”

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confidence: 99%

Porous, High Capacity Coatings for Solid Phase Microextraction by Sputtering

et al. 2016

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We describe a new process for preparing porous solid phase microextraction (SPME) coatings by the sputtering of silicon onto silica fibers. The microstructure of these coatings is a function of the substrate geometry and mean free path of the silicon atoms, and the coating thickness is controlled by the sputtering time. Sputtered silicon structures on silica fibers were treated with piranha solution (a mixture of concd H2SO4 and 30% H2O2) to increase the concentration of silanol groups on their surfaces, and the nanostructures were silanized with octadecyldimethylmethoxysilane in the gas phase. The attachment of this hydrophobic ligand was confirmed by X-ray photoelectron spectroscopy and contact angle goniometry on model, planar silicon substrates. Sputtered silicon coatings adhered strongly to their surfaces, as they were able to pass the Scotch tape adhesion test. The extraction time and temperature for headspace extraction of mixtures of alkanes and alcohols on the sputtered fibers were optimized (5 min and 40 °C), and the extraction performances of SPME fibers with 1.0 or 2.0 μm of sputtered silicon were compared to those from a commercial 7 μm poly(dimethylsiloxane) (PDMS) fiber. For mixtures of alcohols, aldehydes, amines, and esters, the 2.0 μm sputtered silicon fiber yielded signals that were 3-9, 3-5, 2.5-4.5, and 1.5-2 times higher, respectively, than those of the commercial fiber. For the heavier alkanes (undecane-hexadecane), the 2.0 μm sputtered fiber yielded signals that were approximately 1.0-1.5 times higher than the commercial fiber. The sputtered fibers extracted low molecular weight analytes that were not detectable with the commercial fiber. The selectivity of the sputtered fibers appears to favor analytes that have both a hydrophobic component and hydrogen-bonding capabilities. No detectable carryover between runs was noted for the sputtered fibers. The repeatability (RSD%) for a fiber (n = 3) was less than 10% for all analytes tested, and the between-fiber reproducibility (n = 3) was 0-15%, generally 5-10%, for all analytes tested. The repeatabilities of our sputtered fibers and the commercial 7 μm PDMS fiber are essentially the same. Fibers could be used for at least 300 extractions without loss of performance. More than 50 compounds were identified in a gas chromatography-mass spectrometry headspace analysis of a real world botanical sample with the 2.0 μm fiber.

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Porous, High Capacity Coatings for Solid Phase Microextraction by Sputtering

et al. 2016

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“…To reliably maintain data for more than 10 years, multiple copies are made and the data are periodically migrated . However, these solutions are time consuming, involve additional expenses, require complex systems for large data volumes, and can still result in data loss. − Permanent data-storage media require long-term stability of both “1” and “0” states of the data. For example, a comparison of conventional and permanent data-storage media for optical and solid-state devices is illustrated in Figure .…”

Section: Introductionmentioning

confidence: 99%

Thin-Film Carbon Nanofuses for Permanent Data Storage

et al. 2017

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In this study, we have fabricated nanofuses from thin-film, arc-deposited carbon for use in permanent data storage. Thin-film carbon fuses have fewer fabrication barriers and retain the required resistivity and structural stability to act as a data-storage medium. Carbon thin films were characterized for their electrical, microstructural, and chemical bonding properties. Annealing these films in an argon environment at 400 °C reduced the resistivity from about 4 × 10 –2 Ω cm as deposited to about 5 × 10 –4 Ω cm, allowing a lower blowing voltage. Nanofuses with widths ranging from 200 to 60 nm were fabricated and tested. They blow with voltages between 2 and 5.5 V, and the nanofuses remain stable in both “1” and “0” states under a constantly applied read voltage of 1 V for over 90 h.

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“…These data have appeared, in part, in a previous publication . This BTS thin film was proposed as a potential component in a data storage device and was considered stable vis‐à‐vis the conventional approach . Three statistical (chemometric/pattern recognition) tools were applied to these data.…”

Section: Introductionmentioning

confidence: 99%

Reevaluating the conventional approach for analyzing spectroscopic ellipsometry psi/delta versus time data. Additional statistical rigor may often be appropriate

Bagley

Tolley

Linford

2016

Surf. Interface Anal.

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A standard approach for confirming the stability of thin films consists of probing them over an extended period of time by spectroscopic ellipsometry (SE) and plotting the resulting psi (Ψ) and delta (Δ) values versus time at a few selected wavelengths across the spectral range. In general, if Ψ and Δ remain constant with time, or essentially constant, the material is deemed to be stable. Here, we suggest that in addition to this ‘eyeball’ approach, a statistical analysis of the data may often be appropriate. In particular, we reevaluate a set of Ψ/Δ versus time data from a sputtered bismuth–tellurium–selenium film that appear to remain essentially constant by the traditional approach, subjecting it to a distance analysis, a principal components analysis, and a cluster analysis. The application of these statistical tools, especially to range‐selected data (300–989 nm), reveals previously unobserved changes, suggesting that either the film in question or the analytical approach itself had changed during the course of the measurements. Weighted distance formulas for Ψ and Δ were also applied so that the data did not need to be range selected for the key effects to be observed. The distance approach was similarly applied (i) to a set of SE data from a thin carbon film, which revealed consistent changes in the material that were not apparent in the standard approach, and (ii) to samples that were deliberately contaminated or improperly measured. Thus, we recommend a more rigorous, statistical approach to the analysis of SE Ψ/Δ versus time data. Copyright © 2016 John Wiley & Sons, Ltd.

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Carbon-Coated Tellurium for Optical Data Storage

Cited by 11 publications

References 13 publications

Porous, High Capacity Coatings for Solid Phase Microextraction by Sputtering

Porous, High Capacity Coatings for Solid Phase Microextraction by Sputtering

Thin-Film Carbon Nanofuses for Permanent Data Storage

Reevaluating the conventional approach for analyzing spectroscopic ellipsometry psi/delta versus time data. Additional statistical rigor may often be appropriate

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