2019
DOI: 10.1016/j.infrared.2018.11.024
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Carrier concentration and transport in Be-doped InAsSb for infrared sensing applications

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Cited by 6 publications
(5 citation statements)
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“…Namely, E a = −14 meV in the first layer and E a = −8 meV in the second one, counted from the top of the heavy‐hole band. These values are different from the literature data of E a ≈ 20 meV . However, it is well known that as the dopant concentration increases, the dopants start to interact and form an impurity band .…”
contrasting
confidence: 95%
See 1 more Smart Citation
“…Namely, E a = −14 meV in the first layer and E a = −8 meV in the second one, counted from the top of the heavy‐hole band. These values are different from the literature data of E a ≈ 20 meV . However, it is well known that as the dopant concentration increases, the dopants start to interact and form an impurity band .…”
contrasting
confidence: 95%
“…Fortunately, it is not the case for T < 30 K and T > 200 K; therefore, in the following, we concentrate on the results obtained at low (Set I) and high (Set IV) temperatures. Judging from the partial concentrations and mobilities, H 1 spectrum is associated with heavy holes, whereas H 2 peaks originate from the presence of light holes, in agreement with the recent results of Casias et al for very similar 2 μm‐thick InAs 0.91 Sb 0.09 layer, acceptor doped at 3 × 10 18 cm −3 obtained at T = 300 K. However, it is not clear what is the origin of the strong splitting of heavy‐hole spectra, observed at low temperatures, which gradually disappears when peaks broaden and start to overlap.…”
supporting
confidence: 85%
“…This observations could potentially lead to the conclusion, that increasing of soaking time could be beneficial from the final device point of view. 18 This phenomenon will be also interesting and will be further investigated from the point of view of carrier dynamics.…”
Section: Discussionmentioning
confidence: 98%
“…Moreover, it has been well known from the beginning of the 1970s [69,70] that narrow gap III-V semiconductors, especially InAs, creates surface electron accumulation layers. For example, Figure 11 presents band edges of p-type InAs [69] and InAsSb [71] with surface electron accumulation. There is strong electron accumulation on the InAsSb side of InAsSb/GaSb heterojunction due to the staggered type II band alignment.…”
Section: Transport Propertiesmentioning
confidence: 99%
“…Another approach is applied in the case of more complicated structures like that shown in Figure 11b. Mobility spectrum analysis and/or variable temperature and magnetic field-dependent transport analysis with multicarrier fitting models have been applied to segregate the epilayer and surface and interface layer characteristics [71].…”
Section: Transport Propertiesmentioning
confidence: 99%