In Fe/Si multilayers (MLs) prepared by helicon plasma sputtering, we have investigated the structural and magnetic properties as a function of Fe and Si layer thickness systematically. In [Fe 2 nm/ Si 1 nm] 30 and [Fe 3 nm/Si 1 nm] 20 MLs, large lateral Fe grains grow suggesting small atomic intermixing of Fe and Si, and antiferromagnetic coupling between Fe layers occurs, causing a magnetoresistance of about 0.1%. With decreasing the Fe layer thickness and increasing the Si layer thickness, X-ray diffraction patterns indicate peak broadening due to atomic intermixing between Fe and Si layers, and the magnetization curves indicate the change from antiferromagnetic to ferromagnetic coupling between Fe. Furthermore, in this case, the conversion electron Mö ssbauer spectra show that the hyperfine field decreases due to the solution of Si atoms in the bulk Fe phase. Doublet peaks appear because of the formation of iron silicides which cause the degradation of antiferromagnetic coupling.
Introduction In transition-metal/Si multilayers (TM/SiMLs), structural and magnetic properties depend on the layer thickness and change due to the atomic intermixing of TM and Si; the magnetic coupling between Fe layers depends on the Si spacer-layer thickness [1] or on the crystallinity of the iron and iron silicide layers [2]. Tong et al. have suggested that the mechanisms of the antiferromagnetic coupling and the magnetoresistance (MR) effect in Fe/Si MLs are similar to that of metal/metal systems [3]. Strijkers et al. have observed the formation of a nonmagnetic metallic metastable iron silicide with a CsCl structure, which mediates the antiferromagnetic coupling in Fe/Si MLs [4].In this study, we investigate the structural and magnetic properties of helicon-sputtered Fe/Si MLs by X-ray diffraction (XRD), magnetization (VSM), conversion electron Mö ssbauer spectroscopy (CEMS) and resistivity measurements to clarify a relation between magnetic coupling of Fe layers and structure properties.