2011 International Electron Devices Meeting 2011
DOI: 10.1109/iedm.2011.6131649
|View full text |Cite
|
Sign up to set email alerts
|

Challenges and opportunities for HfO<inf>X</inf> based resistive random access memory

Abstract: The binary oxide based resistive memories showing superior electrical performances on the resistive switching are reviewed in this paper. The status and challenges of the HfO X based resistive device with excellent memory properties are presented. Several future challenges for the filamentary type switching device are also addressed.

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1
1

Citation Types

0
23
0

Year Published

2013
2013
2019
2019

Publication Types

Select...
4
3
1

Relationship

0
8

Authors

Journals

citations
Cited by 32 publications
(23 citation statements)
references
References 4 publications
0
23
0
Order By: Relevance
“…6. (2,24), (2,25), (2,26), (3,24), (4, 25), (5, 25), (6, 26), (7,26), (8,27), (9, 27), (9, 28), (9, 29), (10, 28), (11,29), (12,29), (13,30), (14,30), (15,31), (16,32), (17,33), (18,34), (19,35) …”
Section: Application Examples and Resultsmentioning
confidence: 99%
See 2 more Smart Citations
“…6. (2,24), (2,25), (2,26), (3,24), (4, 25), (5, 25), (6, 26), (7,26), (8,27), (9, 27), (9, 28), (9, 29), (10, 28), (11,29), (12,29), (13,30), (14,30), (15,31), (16,32), (17,33), (18,34), (19,35) …”
Section: Application Examples and Resultsmentioning
confidence: 99%
“…Both ES and the fault diagnosis method based on tFRSN P systems (FDM-tFRSNP) can make full use of experts' knowledge. The differences are: an ES needs long response time and the maintenance of its knowledge base is difficult [18]; FDMtFRSNP possesses parallel reasoning ability and adopt graphical knowledge representation and reasoning, which can avoid the main limitation of ES.…”
Section: Discussionmentioning
confidence: 99%
See 1 more Smart Citation
“…This is due to the different ReRAM geometries and to the large variability of the cells utilized for the demonstrator. Nevertheless, improved variability of one order of magnitude has been demonstrated for ReRAM prototypes fabricated with industrial methods [26].…”
Section: Device Descriptionmentioning
confidence: 99%
“…RRAM has received significant attention due to its high scalability, fast write/erase operation, low power consumption and relatively simple fabrication process compared with conventional Flash technology [1,2]. Although the switching characteristics have been explained by many theories, the switching mechanisms are still not fully understood, the most problematic step is the electroforming process of these metal oxide resistive switching (RS) materials [3].…”
Section: Introductionmentioning
confidence: 99%