2020
DOI: 10.35848/1882-0786/ab93a0
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Change of high-voltage conduction mechanism in vertical GaN–on–GaN Schottky diodes at elevated temperatures

Abstract: Current-voltage-temperature characteristics (0 °C to 150 °C) of SBDs on highly compensated 15 μm and 30 μm n-type GaN drift layer were measured for voltages up to −300 V and up to −800 V, respectively. When the temperature is between 75 °C and 100 °C, both SBDs exhibited a similar change in conduction mechanism from thermionic field emission (TFE) to thermionic emission (TE) due to the activation of N-vacancies (VN) (Ea = −1.67 ± 0.02 eV). However, at high voltages when the temperature is >100 °C, the conducti… Show more

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Cited by 3 publications
(4 citation statements)
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“…[ 249 ] The reliability and thermal management of vertical GaN devices are also superior by moving the peak electric field away from the surface into bulk. The high‐mobility GaN drift regions are usually grown on the high conductivity substrates, such as freestanding n + ‐GaN [ 250–253 ] and n + ‐Si. [ 254–256 ] The fully vertical drift regions can also directly contact to the electrodes after the selective removal of the substrates and buffer layers, followed by a wafer‐bonding transfer procedure.…”
Section: Discussionmentioning
confidence: 99%
See 1 more Smart Citation
“…[ 249 ] The reliability and thermal management of vertical GaN devices are also superior by moving the peak electric field away from the surface into bulk. The high‐mobility GaN drift regions are usually grown on the high conductivity substrates, such as freestanding n + ‐GaN [ 250–253 ] and n + ‐Si. [ 254–256 ] The fully vertical drift regions can also directly contact to the electrodes after the selective removal of the substrates and buffer layers, followed by a wafer‐bonding transfer procedure.…”
Section: Discussionmentioning
confidence: 99%
“…[ 260–264 ] In particular, the current aperture vertical electron transistor (CAVET) [ 265–268 ] and trench CAVET [ 269–271 ] can operate the device by controlling the 2DEG channel, similarly to the lateral GaN HEMTs. Recently, the advanced vertical and quasi‐vertical GaN Schottky barrier diodes (SBDs), [ 253,272,273 ] junction barrier Schottky diodes, [ 274 ] fin MOSFETs, [ 275 ] trench MOSFETs, [ 276 ] superjunction diodes [ 277 ] and PN diodes [ 278–280 ] have successively raised the V BD from 600 to 4000 V with low R on . The roadmap of high‐performance vertical GaN power devices is to realize the low‐cost layer transfer and homoepitaxy technologies, while the lateral GaN power HEMT applications focus on the device reliability and the compatibility with the matured Si‐CMOS lines.…”
Section: Discussionmentioning
confidence: 99%
“…Shibata, D. et al has reported the use of junction barrier Schottky (JBS) with p-type termination on SBDs with 13 µm thick DL to measure a V BD value of 1600 V [64]. The improvement in V BD was reported to be due to the reduction of CCD in the MOCVD grown GaN DLs [43,58].…”
Section: Breakdown Voltage Of Sbdmentioning
confidence: 99%
“…In previous papers, the high leakage current in Schottky diodes on bulk GaN was correlated with the presence of structural defects in the epilayer [11,12,13]. Moreover, the mechanisms of current transport dominating the electrical behaviour at the metal/GaN interface have been recently discussed [14,15]. New metallization schemes or advanced field plate structures have been proposed to reduce the leakage current in vertical Schottky diodes on homoepitaxial GaN epilayers.…”
Section: Introductionmentioning
confidence: 99%