1995
DOI: 10.1088/0960-1317/5/2/025
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Characterisation of sol-gel PZT films on Pt-coated substrates

Abstract: A conventional sol-gel process was used to spin-cast PZT films on oxidized Si wafers coated with sputtered Pt layers. After annealing at 550 "C4OO"C, the resulting perovskite-type PZT films showed different textures and surface morphologies, depending on whether or not a Ti adhesion layer was used. If a Ti layer was present, Ti diffusion into and through the Pt film leads to a compound &Ti, which facilitates crystallization of the perovskite PZT phase; without Ti, crystallization is more difficult and occurs v… Show more

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Cited by 10 publications
(7 citation statements)
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“…This process primarily forms a tetragonal-phase PZT layer featuring more effective ferroelectric properties than other phases [18]. The solution was spin-coated at 4000 rpm for 20 s repeatedly six times on a Pt (100 nm)/Ti (20 nm)/SiO 2 (300 nm)/Si wafer that promoted the crystallization of a perovskite PZT structure after each coating, followed by baking at 300 • C for 5 min [19]. The sample structure was subsequently annealed for 30 min at 650 • C to promote the crystallization.…”
Section: Methodsmentioning
confidence: 99%
“…This process primarily forms a tetragonal-phase PZT layer featuring more effective ferroelectric properties than other phases [18]. The solution was spin-coated at 4000 rpm for 20 s repeatedly six times on a Pt (100 nm)/Ti (20 nm)/SiO 2 (300 nm)/Si wafer that promoted the crystallization of a perovskite PZT structure after each coating, followed by baking at 300 • C for 5 min [19]. The sample structure was subsequently annealed for 30 min at 650 • C to promote the crystallization.…”
Section: Methodsmentioning
confidence: 99%
“…Integration of PZT films on Si using Pt buffer layers (also serves as bottom electrode) is a low temperature process, but the films show poor ferroelectric properties. 16,17 Recently, integration of PZT films on Si have been achieved using nanometer-thick crystalline layers, namely nanosheets. 18 Since the integration using nanosheets was achieved at 600 ºC, this gives an opportunity to extend the integration of PZT on glass using nanosheets.…”
Section: Manuscriptmentioning
confidence: 99%
“…CeO 2 is another buffer layer which is employed in combination with YSZ to reduce the lattice mismatch further. Successful integration of functional oxides on Si substrate has been reported in literature (Chopra et al 2013, Chopra, Alexe, andHesse 2015a;Gardeniers, Smith, and Cobianu 1995). (001)-oriented growth of oxides is achieved by fabricating Si (100)/YSZ/CeO 2 /LaNiO 3 structures (Chopra et al 2013).…”
Section: Substratementioning
confidence: 99%