Characteristic quantities of a cascade arc used as a light source for spectroscopic techniques

Wilbers, Atm; Kroesen, Gmw Gerrit; Timmermans, CJ; Schram, DC Daan

doi:10.1088/0957-0233/1/12/012

Cited by 45 publications

(24 citation statements)

References 5 publications

(3 reference statements)

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“…14 -16 A detailed description of the light source was given by Wilbers et al 15,16 and by Raghavan et al 14 The light source used is operated with argon at pressure of 1.8 bar and argon flow of 10 sccm. The operating current was set to 25 A and the light that exited the window of the arc is KBr with a thickness of 4 mm.…”

Section: A Light Sourcementioning

confidence: 99%

“…͑It is known that changing the gas from argon to xenon has a positive influence on the light intensity. 15 ͒ Increasing the arc current has a strong influence on the light intensity, an increase of 10% in the current results in an increase of 10% in the light intensity emitted. A 10% increase of gas pressure however results in only a 5% increase of emitted light intensity.…”

Section: A Light Sourcementioning

confidence: 99%

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Design of a fast in situ infrared diagnostic tool

Hest

Klaver

Schram

et al. 2003

Review of Scientific Instruments

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Articles you may be interested inDesign, development, and demonstration of a fully LabVIEW controlled in situ electrochemical Fourier transform infrared setup combined with a wall-jet electrode to investigate the electrochemical interface of nanoparticulate electrocatalysts under reaction conditions Rev. Sci. Instrum. 84, 074103 (2013); 10.1063/1.4816826 Design and operating characteristics of a transient kinetic analysis catalysis reactor system employing in situ transmission Fourier transform infrared Rev. Sci. Instrum. 77, 094104 (2006); 10.1063/1.2349602 Characterization of the rapid expansion of supercritical solutions by Fourier transform infrared spectroscopy in situ Rev. Sci. Instrum. 76, 053904 (2005);

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Section: A Light Sourcementioning

confidence: 99%

Section: A Light Sourcementioning

confidence: 99%

Design of a fast in situ infrared diagnostic tool

Hest

Klaver

Schram

et al. 2003

Review of Scientific Instruments

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“…Another complication in this study is the presence of a signal at the spectrometer detector generated by plasma photons: the cascaded arc plasma source, which produces a large photon flux covering the total spectral range, 45 is perfectly aligned with the mass spectrometers orifice ͑see Fig. 1͒.…”

Section: Ion Mass Spectrometrymentioning

confidence: 99%

Formation of cationic silicon clusters in a remote silane plasma and their contribution to hydrogenated amorphous silicon film growth

Kessels

Leewis

Sanden

et al. 1999

Journal of Applied Physics

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Document VersionPublisher's PDF, also known as Version of Record (includes final page, issue and volume numbers)Please check the document version of this publication:• A submitted manuscript is the author's version of the article upon submission and before peer-review. There can be important differences between the submitted version and the official published version of record. People interested in the research are advised to contact the author for the final version of the publication, or visit the DOI to the publisher's website.• The final author version and the galley proof are versions of the publication after peer review.• The final published version features the final layout of the paper including the volume, issue and page numbers. Link to publication General rightsCopyright and moral rights for the publications made accessible in the public portal are retained by the authors and/or other copyright owners and it is a condition of accessing publications that users recognise and abide by the legal requirements associated with these rights.• Users may download and print one copy of any publication from the public portal for the purpose of private study or research.• You may not further distribute the material or use it for any profit-making activity or commercial gain • You may freely distribute the URL identifying the publication in the public portal ? Take down policyIf you believe that this document breaches copyright please contact us providing details, and we will remove access to the work immediately and investigate your claim. The formation of cationic silicon clusters Si n H m ϩ by means of ion-molecule reactions in a remote Ar-H 2 -SiH 4 plasma is studied by a combination of ion mass spectrometry and Langmuir probe measurements. The plasma, used for high growth rate deposition of hydrogenated amorphous silicon ͑a-Si:H͒, is based on SiH 4 dissociation in a downstream region by a thermal plasma source created Ar-H 2 plasma. The electron temperature, ion fluence, and most abundant ion emanating from this plasma source are studied as a function of H 2 admixture in the source. The electron temperature obtained is in the range of 0.1-0.3 eV and is too low for electron induced ionization. The formation of silicon containing ions is therefore determined by charge transfer reactions between ions emanating from the plasma source and SiH 4 . While the ion fluence from the source decreases by about a factor of 40 when a considerable flow of H 2 is admixed in the source, the flux of cationic silicon clusters towards the substrate depends only slightly on this H 2 flow. This implies a strong dissociative recombination of silicon containing ions with electrons in the downstream region for low H 2 flows and it causes the distribution of the cationic silicon clusters with respect to the silicon atoms present in the clusters to be rather independent of H 2 admixture. The average cluster size increases, however, strongly with the SiH 4 flow for constant plasma source properties. Moreover, it leads to a decrease of the...

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“…Previous research shows that the cascaded arc is an ideal design to create a stable arc plasma with high electron density as well as an expanding plasma for both plasma studies and applied research. 13,14 It has been shown that the expanding cascaded arc plasmas have potential prospect in different application fields; e.g., using a cascaded arc as a light source for spectroscopy, 15 as a particle source for surface modification,13 silicon thin film deposition, 16 carbon thin film deposition 17 and passivation protection technique for archaeological artefacts. 6 Mostly noble gases are used to feed the arc plasma, but exceptionally molecular gases like H 2 and SF 6 are added.…”

Section: Introductionmentioning

confidence: 99%

Diagnostics of the magnetized low-pressure hydrogen plasma jet: Molecular regime

Qing

Otorbaev

Brussaard

et al. 1996

Journal of Applied Physics

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Optical emission and absorption spectroscopy and double Langmuir probe diagnostics have been applied to measure the plasma parameters of an expanding magnetized hydrogen plasma jet. The rotational temperature of the excited state H 2 ͑d 2 ⌸ u ) has been determined by analyzing the intensity distribution of the spectral lines of the Fulcher-␣ system of H 2 . The gas temperature in the plasma, which is twice the value of the rotational temperature is equal to Ӎ 520 K. Several clear indications of presence of the ''hot'' electrons have been observed in the plasma: ͑1͒ Langmuir probe measurements ͑T e Ӎ1.4 eV͒, ͑2͒ appearance of the Fulcher-␣ system of H 2 ͑excitation potential ⌬Eϭ13.87 eV͒, ͑3͒ low rotational temperature ͑T rot * Ӎ260 K͒ of the excited H 2 ͑d 3 ⌸ u ) molecules, ͑4͒ local excitation in the plasma of Ar I͑⌬E ϭ15.45 eV͒, and Ar II͑⌬E ϭ19.68 eV͒ spectral lines, ͑5͒ local excitation in the plasma of He I͑⌬E ϭ23.07 eV and ⌬Eϭ24.04 eV͒ spectral lines. Optical actinometry has been applied to measure the absolute density of hydrogen atoms and hydrogen dissociation degree in the plasma. The measured absolute density of hydrogen atoms are in the ͑1-1.4͒ϫ10 20 m Ϫ3 range, and the corresponding dissociation degree of the hydrogen plasma is in the range of 8%-13%.

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Characteristic quantities of a cascade arc used as a light source for spectroscopic techniques

Cited by 45 publications

References 5 publications

Design of a fast in situ infrared diagnostic tool

Design of a fast in situ infrared diagnostic tool

Formation of cationic silicon clusters in a remote silane plasma and their contribution to hydrogenated amorphous silicon film growth

Diagnostics of the magnetized low-pressure hydrogen plasma jet: Molecular regime

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