2019
DOI: 10.1088/2053-1591/ab3a6c
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Characterization of low resistivity Ga-doped ZnO thin films on Si substrates prepared by pulsed laser deposition

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Cited by 5 publications
(1 citation statement)
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“…Further, the number and height of the sharp peaks decreased with the oxygen content increase during sputtering (Figure 3c,d). This might be due to the better crystallites arrangement because of the GZO films densification and voids filling [32]. Therefore, depending on the oxidizing conditions, the optimal film can be smooth on an atomic level.…”
Section: Resultsmentioning
confidence: 99%
“…Further, the number and height of the sharp peaks decreased with the oxygen content increase during sputtering (Figure 3c,d). This might be due to the better crystallites arrangement because of the GZO films densification and voids filling [32]. Therefore, depending on the oxidizing conditions, the optimal film can be smooth on an atomic level.…”
Section: Resultsmentioning
confidence: 99%