Characterization of reactive ion etching of benzocyclobutente in SF6/O2 plasmas

Chen, Qianwen; Wang, Zheyao; Tang, Zhiming; Liu, Litian

doi:10.1016/j.mee.2009.11.165

Cited by 14 publications

(6 citation statements)

References 26 publications

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“…2,6,10,11 The resulting nonideal surface after etching can adversely affect profile morphology and lead to interconnect failure. Postetch residue from BCB has been shown to also increase contact resistance and is unable to be removed by the typical O 2 ashing processes.…”

Section: Resultsmentioning

confidence: 99%

Low-pressure inductively coupled plasma etching of benzocyclobutene with SF6/O2 plasma chemistry

Douglas

Stevens

Fishgrab

et al. 2012

Journal of Vacuum Science &Amp; Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phen

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Section: Resultsmentioning

confidence: 99%

Low-pressure inductively coupled plasma etching of benzocyclobutene with SF6/O2 plasma chemistry

Douglas

Stevens

Fishgrab

et al. 2012

Journal of Vacuum Science &Amp; Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phen

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“…tenth of microns. We first studied BCB etching with a photoresist mask using both fluorine and oxygen such as SF 6 0 2 gas mixture (Chen et al, 2010): the fluorine removes the silicon in BCB and the oxygen reacts with the carbon and organic content. We analyzed the influence of the plasma etching parameters, i.e.…”

Section: Dielectric Filling Of the Trenchesmentioning

confidence: 99%

Design and realization of deep trench superjunction diode for 600V applications

Noblecourt¹,

Tasselli²,

Morancho³

et al. 2014

E.J.E.E

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The purpose of this paper is to present the Deep Trench SuperJunction Diode (DT-SJDiode) optimization and realization with a 600V breakdown voltage. We present technological and geometrical parameters influences on the breakdown voltage with simulations performed with Sentaurus TCAD. Previous works allowed to validate some critical technological process steps and to create a technological process for 1200V breakdown voltage applications. The main point here is to optimize those process steps (trench verticality, termination fulfilling...), which have an important influence on the electrical properties, in order to fabricate a 600V breakdown voltage DT-SJDiode. RESUME-L'objectif de ce papier est de présenter l'optimisation et la réalisation d'une diode à superjonction et à tranchées profondes et de sa terminaison (DT-SJDiode) pouvant tenir des tensions de 600 V à l'état bloqué. Nous étudierons l'influence des paramètres technologiques et géométriques sur la tenue en tension à partir de simulations effectuées sous Sentaurus TCAD. Des travaux précédents ont permis de valider certaines étapes technologiques et de dégager un procédé de fabrication pour des applications à 1200V. Il s'agit ici d'optimiser ces différentes étapes qui influent sur les paramètres électriques (verticalité des tranchées, remplissage des tranchées de terminaison de jonction, …) pour des applications à 600V.

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“…In comparison with the wet etching technique in our previous work (Tsai et al, 2010), it is more easy to control the etched depth and profile of the isotropic trench. The purpose of the isotropic etching is achieved by adjusting the gaseous quantity of RIE, i.e., sulfur hexafluoride (SF 6 ), oxygen (O 2 ) and argon (Ar) (Chen et al, 2010). Because the passive layer is created by the interaction of the silicon and O 2 so the sidewall of the trench can be protected, i.e., the anisotropic trench can be constructed.…”

Section: U-type Solenoidmentioning

confidence: 99%

Dynamic analysis and collision prevention for μ-disc-type inductive micro-motor driven by solenoids

Tsai

Lin

2013

Journal of Vibration and Control

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An innovative μ-disc-type inductive micro-motor is proposed and studied in this paper. The novel 3D solenoid-type electromagnetic poles are designed and fabricated by dry isotropic etching technique so that the output torque of the inductive motor can be greatly increased even though a simpler fabrication procedure is employed. On the other hand, the order-reduced dynamic model for the proposed micro-motor is established by using the singular perturbation theory. Based on the order-reduced model, a composite controller is synthesized to prevent potential collision between the disc and the center bearing by sliding mode control strategy and successfully suppress the unfavorable periodic oscillation, due to eccentricity of the disc, by an anti-swaying policy. Eventually, a few comparisons on several typical operational conditions, such as various vacuum levels, van der waals force and periodic disturbance, are also addressed and presented. The efficacy of the composite controller and the performance of the proposed micro-motor are verified by intensive simulations undertaken via the commercial software, Matlab/Simulink, and the interface module dSpace DS 1104 Board. Finally, the superior performance for the proposed micro-motor is assured, e.g., the collision between the disc and the center bearing can be successfully prevented and a constant spinning speed can be retained even if a certain degree of disturbance and uncertainty abruptly occurs.

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Characterization of reactive ion etching of benzocyclobutente in SF6/O2 plasmas

Cited by 14 publications

References 26 publications

Low-pressure inductively coupled plasma etching of benzocyclobutene with SF6/O2 plasma chemistry

Low-pressure inductively coupled plasma etching of benzocyclobutene with SF6/O2 plasma chemistry

Design and realization of deep trench superjunction diode for 600V applications

Dynamic analysis and collision prevention for μ-disc-type inductive micro-motor driven by solenoids

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