The authors measure the temperature dependence of the components of threshold current of 1300 nm undoped and p-doped quantum dot lasers and show that the temperature dependence of the injection level necessary to achieve the required gain is the largest factor in producing the observed negative T 0 in p-doped quantum dot lasers. © 2006 American Institute of Physics. ͓DOI: 10.1063/1.2361167͔ p-type modulation doped In͑Ga͒As quantum dot lasers have attracted much interest recently, partially due to reports of an infinite or negative characteristic temperature ͑T 0 ͒ around room temperature. 1-3 Several authors have attributed this behavior to the temperature dependence of the Auger recombination process in doped structures, 2,4,5 although the particulars of the explanation varied in each case. In this work we report on measurements made on both intrinsic and p-doped quantum dot structures that emit at 1.3 m. From studying the radiative and nonradiative components of the threshold current we show that the temperature performance of p-doped lasers can be described without needing to consider Auger recombination.Two samples were grown by solid source molecular beam epitaxy on 3 in. n + ͑100͒ GaAs substrates. The devices were nominally identical except for the level of modulation doping. The active region consisted of five dot-in-a-well ͑DWELL͒ repeats, where each DWELL was made up of 3.0 ML of InAs grown on 2 nm of In 0.15 Ga 0.85 As and then capped by a further 6 nm of In 0.15 Ga 0.85 As, and these were then separated by 50 nm GaAs spacers. The active region was incorporated into a GaAs-Al 0.4 Ga 0.6 As waveguide structure. The lower n-contact region was doped with Si at 5 ϫ 10 18 cm −3 while the upper p contact was doped with Be at 5 ϫ 10 17 cm −3 , the p contact was finished with a 300 nm layer of GaAs doped at 1 ϫ 10 19 cm −3 . The growth temperature for the cladding layers was 620°C, while the InAs layers were grown at 510°C, the GaAs spacers were grown in two temperature steps; the first 15 nm at 510°C and the final 35 nm at 580°C, forming the so called high growth temperature spacer layers. 6 The doping consisted of Be atoms incorporated over a 6 nm region of GaAs situated 9 nm below each DWELL at a concentration of either 0 or 7.5 ϫ 10 17 cm −3 corresponding to either 0 or 15 acceptor atoms per quantum dot. Previous work on these structures has shown that the absorption spectra, and therefore the quantum dot states, are the same for the two structures. 7The threshold current was measured as a function of temperature on 2000 m long, 50 m wide oxide stripe lasers for both structures under pulsed conditions with a pulse length of 400 ns and a repetition rate of 1 kHz to avoid any self-heating, and this is shown in Fig. 1. The undoped structure shows a monotonically increasing threshold current from low to high temperatures as is normally observed for undoped quantum dot and quantum well structures. The p-doped structure exhibits a threshold current density that decreases as the temperature increases from 200 K r...