Reliable, efficient electrically pumped silicon-based lasers would enable full integration of photonic and electronic circuits, but have previously only been realized by wafer bonding. Here, we demonstrate the first continuous-wave InAs/GaAs quantum-dot lasers directly grown on silicon substrates with a low threshold current density of 62.5 A/cm 2 , a room-temperature output power exceeding 105 mW, lasing operation up to 120 o C, and over 3,100 hours of continuous-wave operating data collected, giving an extrapolated mean time to failure of over 100,158 hours. The realization of highperformance quantum-dot lasers on silicon is due to the achievement of a low density of threading dislocations on the order of 10 5 cm -2 in the III-V epilayers by combining a nucleation layer and dislocation filter layers with in-situ thermal annealing. These results are a major advance towards silicon-based photonics and photonic-electronic integration, and could provide a route towards reliable and cost-effective monolithic integration of III-V devices on silicon.Increased data throughput between silicon processors in modern information processing demands unprecedented bandwidth and low power consumption beyond the capability of conventional copper interconnects. To meet these requirements, silicon photonics has been under intensive study in recent years 1,2 . Despite rapid progress being made in silicon-based light modulation and detection technology and low-cost silicon optoelectronic integrated devices enabled by the mature CMOS technology 3,4 , an efficient reliable electrically pumped laser on a silicon substrate has remained an unrealized scientific challenge 5 . Group IV semiconductors widely used in integrated circuits, e.g. silicon and germanium, are inefficient light-emitting materials due to their indirect bandgap, introducing a major barrier to the development of silicon photonics. Integration of IIIÐV materials on a silicon platform has been one of the most promising techniques for generating coherent light on silicon. IIIÐV semiconductors with superior optical properties, acting as optical gain media, can be either bonded or epitaxially grown on silicon substrates [6][7][8][9][10][11] , with the latter approach being more attractive for large scale, low-cost, and streamlined fabrication. However, until now, material lattice mismatch and incompatible thermal expansion coefficients between IIIÐV materials and silicon substrates have fundamentally limited the monolithic growth of IIIÐV lasers on silicon substrates by introducing high-density threading dislocations (TDs) 12 .Lasers with active regions formed from III-V quantum dots (QDs), nano-size crystals, can not only offer low threshold current density (J th ) but also reduced temperature sensitivity [13][14][15][16][17] . As shown in Figure 1a, within less than 10 years, the performance of QD lasers has surpassed state-of-the-art quantum-well (QW) lasers developed over the last few decades in terms of J th . QD lasers have now been demonstrated with nearly constan...

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Using experimental measurements of the gain-current characteristic as a function of temperature in InGaAs quantum-dot lasers, we demonstrate that it is the population of wetting-layer states that leads to a saturation of the population inversion in dot states and hence to the saturation of gain in a quantum-dot laser. At 300 K, the maximum modal gain for a three-layer structure is reduced from 53 to 14 cm Ϫ1 .

In many studies, the value of the experimentally determined internal piezoelectric field has been reported to be significantly smaller than theoretical values. We believe this is due to an inappropriate approximation for the electric field within the depletion region, which is used in the analysis of experimental data, and we propose an alternative method. Using this alternative, we have measured the strength of the internal field of InGaN p-i-n structures, using reverse bias photocurrent absorption spectroscopy and by fitting the bias dependent peak energy using microscopic theory based on the screened Hartree-Fock approximation. The results agree with those using material constants interpolated from binary values. © 2005 American Institute of Physics. ͓DOI: 10.1063/1.1896446͔The internal field in GaN based quantum wells plays an important role in the operation of nitride-based light emitting diodes and lasers, affecting the emission wavelength, 1 the oscillator strength, 2 and the recombination lifetime, 3 hence an accurate value of the internal field is essential in understanding the properties of these devices. The internal field skews and breaks the symmetry of the well, causing spatial separation of the electron and hole wave functions and hence reduces the electron-hole overlap function. Reported values of the internal field 4,5 for the same nominal indium content vary by more than a factor of two, which is far greater than the expected error due to unintended variations in the indium content. Also there are large reported differences between theoretical and experimental results. 6 The majority of approaches to determine the internal field, have relied upon counteracting the quantum-confined Stark effect with an externally applied reverse bias and measuring properties of the quantum well as a function of this applied reverse bias. The reverse bias acts to oppose the internal field reducing the effect of the induced quantum confined Stark effect. At low bias, the well is skewed due to the internal field. At a critical bias, the contributions from the applied bias and the internal field are equal and opposite. In this case, the overlap of electron and hole wave functions and the ground state electron to heavy hole transition energy are maximized.The value of the externally applied bias to achieve flat band ͑"square-up" the quantum well͒ can then be used to obtain the internal field. The net internal field E in the well ͑E = 0 when the well is square͒ is related to the applied bias V using: 4where E int , L w , N, 0 , d d , and d u are the internal field, the quantum well width, the number of quantum wells, the built-in potential and the depletion and intrinsic widths, respectively. The width of the intrinsic region d u is given by the sum of the multiple well and barrier widths. The internal field E int , is the sum of the fields due to the piezoelectric effect and the spontaneous polarization. The first term of Eq. ͑1͒ is the background field written as the total voltage drop divided by the distance, over ...

Electroluminescence light-emitting diodes enabled by hybridising colloidal quantum dots is an emerging technology for large-area and foldable ambient lighting. We summerise state-of-the-art scientific challenges and prospect their future development.